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J-GLOBAL ID：201902214127353327   Reference number：19S1337986

Sub-μm electrode spacing SOI-PIN photodiode fabricated by CMOS compatible process

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Author (3)：
Mitsuno, Hiroya

About Mitsuno, Hiroya

(School of Electrical and Computer Engineering, College of Science and Engineering, Kanazawa University)

About School of Electrical and Computer Engineering, College of Science and Engineering, Kanazawa University

, 
Maruyama, Takeo

About Maruyama, Takeo

(School of Electrical and Computer Engineering, College of Science and Engineering, Kanazawa University)

About School of Electrical and Computer Engineering, College of Science and Engineering, Kanazawa University

, 
Iiyama, Koichi

About Iiyama, Koichi

(School of Electrical and Computer Engineering, College of Science and Engineering, Kanazawa University)

About School of Electrical and Computer Engineering, College of Science and Engineering, Kanazawa University


Material：
2016 21st OptoElectronics and Communications Conference, OECC 2016 - Held Jointly with 2016 International Conference on Photonics in Switching, PS 2016

About 2016 21st OptoElectronics and Communications Conference, OECC 2016 - Held Jointly with 2016 International Conference on Photonics in Switching, PS 2016


Publication year： 2016 
JST Material Number： SCOPUS  ISBN： 9784885523052 
Country of issue： United States (USA)  Language： English (EN)
Terms in the title (1)：
Terms in the title
Keywords automatically extracted from the title.
CMOS

About CMOS


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