Art

J-GLOBAL ID：201902217479824752   Reference number：19S1939543

Fabrication of a silicon oxide film by ozone and 1,1,1,3,3,3- hexamethyldisilazane (HMDS): Infrared Absorption analysis on a photochemical reaction in the gas phase

Author (7)： Nakamura, Ken (National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2) ,  Nonaka, Hidehiko (National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2) ,  Kameda, Naoto (National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2) ,  Kameda, Naoto (Meidensha Corporation) ,  Nishiguchi, Tetsuya (National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2) ,  Nishiguchi, Tetsuya (Meidensha Corporation) ,  Ichimura, Shingo (National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2)
Material： Journal of the Vacuum Society of Japan
Volume： 51  Issue： 3  Page： 224-227  Publication year： 2008 
JST Material Number： SCOPUS  ISSN： 1882-2398  CODEN： SHINA 
Country of issue： Japan (JPN)  Language： Japanese (JA)

Terms in the title (1)： HMDS