Art

J-GLOBAL ID：201902217848545692   Reference number：19S1167199

Epitaxial growth of C60 thin films using continuous-wave laser molecular beam epitaxy

Author (11)： Yaginuma, Seiichiro (Materials and Structures Laboratory, Tokyo Institute of Technology) ,  Yaginuma, Seiichiro (Graduate School of Frontier Sciences, University of Tokyo) ,  Katayama, Masao (Materials and Structures Laboratory, Tokyo Institute of Technology) ,  Katayama, Masao (CREST, Japan Science and Technology Agency) ,  Matsumoto, Yuji (Materials and Structures Laboratory, Tokyo Institute of Technology) ,  Matsumoto, Yuji (CREST, Japan Science and Technology Agency) ,  Itaka, Kenji (Graduate School of Frontier Sciences, University of Tokyo) ,  Itaka, Kenji (CREST, Japan Science and Technology Agency) ,  Koinuma, Hideomi (Graduate School of Frontier Sciences, University of Tokyo) ,  Koinuma, Hideomi (CREST, Japan Science and Technology Agency) ,  Haemori, Masamitsu (NIMS)
Material： Materials Research Society Symposium Proceedings
Volume： 965  Page： 223-227  Publication year： 2006 
JST Material Number： SCOPUS  ISSN： 0272-9172  ISBN： 9781604234176  CODEN： MRSPD 
Country of issue： United States (USA)  Language： English (EN)

Terms in the title (2)： C60 ,  LASER