Art
J-GLOBAL ID:201902218834325442   Reference number:19A2691832

Study of self-masking nanostructuring of boron doped diamond films by RF plasma etching

RFプラズマエッチングによるホウ素ドープダイヤモンド膜の自己マスキング・ナノ構造化の研究【JST・京大機械翻訳】
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Material:
Volume: 170  Page: Null  Publication year: 2019 
JST Material Number: E0347A  ISSN: 0042-207X  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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The surface nanostructuring of...
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Thin films of other inorganic compounds  ,  Manufacturing technology of solid-state devices  ,  Oxide thin films  ,  Electric conduction in crystalline semiconductors 

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