Art

J-GLOBAL ID：201902218974789161   Reference number：19S1241894

Micro-raman characterization of cluster carbon implanted si before and after rapid thermal annealing

Author (7)： Yoo, Woo Sik (WaferMasters, Inc.) ,  Kang, Kitaek (WaferMasters, Inc.) ,  Nishigaki, Hiroshi (Kyoto Institute of Technology) ,  Hasuike, Noriyuki (Kyoto Institute of Technology) ,  Harima, Hiroshi (Kyoto Institute of Technology) ,  Yoshimoto, Masahiro (Kyoto Institute of Technology) ,  Sekar, Karuppanan (Nissin Ion Equipment USA, Inc.)
Material： ECS Transactions
Volume： 75  Issue： 8  Page： 605-613  Publication year： 2016 
JST Material Number： SCOPUS  ISSN： 1938-5862  ISBN： 9781607685395 
Country of issue： United States (USA)  Language： English (EN)

Terms in the title (2)： Si ,  RaPID