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J-GLOBAL ID：201902220228801681   Reference number：19S1209537

Negative-tone molecular resist for EUV lithography

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Author (8)：
Kojima, Kyoko

About Kojima, Kyoko

(Central Research Laboratory, Hitachi, Ltd.)

About Central Research Laboratory, Hitachi, Ltd.

, 
Fukuda, Hiroshi

About Fukuda, Hiroshi

(Central Research Laboratory, Hitachi, Ltd.)

About Central Research Laboratory, Hitachi, Ltd.

, 
Mori, Shigeki

About Mori, Shigeki

(Hitachi ULSI Sys. Co. Ltd.)

About Hitachi ULSI Sys. Co. Ltd.

, 
Hada, Hideo

About Hada, Hideo

(Tokyo Ohka Kogyo)

About Tokyo Ohka Kogyo

, 
Shiono, Daiju

About Shiono, Daiju

(Tokyo Ohka Kogyo)

About Tokyo Ohka Kogyo

, 
Onodera, Junichi

About Onodera, Junichi

(Tokyo Ohka Kogyo)

About Tokyo Ohka Kogyo

, 
Oizumi, Hiroaki

About Oizumi, Hiroaki

(ASET EUV Process Technology Research Lab.)

About ASET EUV Process Technology Research Lab.

, 
Nishiyama, Iwao

About Nishiyama, Iwao

(ASET EUV Process Technology Research Lab.)

About ASET EUV Process Technology Research Lab.


Material：
Polymer Preprints, Japan

About Polymer Preprints, Japan


Volume： 55  Issue： 2  Page： 3252-3253  Publication year： 2006 
JST Material Number： SCOPUS 
Country of issue： Japan (JPN)  Language： Japanese (JA)
Terms in the title (1)：
Terms in the title
Keywords automatically extracted from the title.
EUV

About EUV


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