Art

J-GLOBAL ID：201902220469027979   Reference number：19S0673090

Uniform characteristics of Si-wire waveguide devices fabricated on 300 mm SOI wafers by using ArF immersion lithography

Author (12)： Tanushi, Yuichiro (Department of Communication Engineering, Tohoku University) ,  Kita, Tomohiro (Department of Communication Engineering, Tohoku University) ,  Yamada, Hirohito (Department of Communication Engineering, Tohoku University) ,  Toyama, Munehiro (National Institute of Advanced Industrial Science and Technology (AIST)) ,  Seki, Miyoshi (National Institute of Advanced Industrial Science and Technology (AIST)) ,  Koshino, Keiji (National Institute of Advanced Industrial Science and Technology (AIST)) ,  Yokoyama, Nobuyuki (National Institute of Advanced Industrial Science and Technology (AIST)) ,  Ohtsuka, Minoru (National Institute of Advanced Industrial Science and Technology (AIST)) ,  Sugiyama, Akinobu (National Institute of Advanced Industrial Science and Technology (AIST)) ,  Ishitsuka, Eiichi (National Institute of Advanced Industrial Science and Technology (AIST)) ,  Sano, Tsukuru (National Institute of Advanced Industrial Science and Technology (AIST)) ,  Horikawa, Tsuyoshi (National Institute of Advanced Industrial Science and Technology (AIST))
Material： IEEE International Conference on Group IV Photonics GFP
Page： 105-106  Publication year： 2013 
JST Material Number： SCOPUS  ISSN： 1949-2081  ISBN： 9781467358040 
Country of issue： United States (USA)  Language： English (EN)

Terms in the title (2)： SOI ,  ARF