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J-GLOBAL ID：201902235708661816   Reference number：19A2088108

Evaluation of dissolved oxygen concentration in silicon wafers by measuring infrared attenuated total reflection

赤外減衰全反射測定によるシリコンウエハにおける溶存酸素濃度の評価【JST・京大機械翻訳】

Author (5)： Usuki Kenshiro (Fukushima University, 1 Kanayagawa, Fukushima, Fukushima 960-1296 Japan) ,  Mochizuki Toshimitsu (National Institute of Advanced Industrial Science and Technology, 2-2-9 Machiikedai, Koriyama, Fukushima 963-0298 Japan) ,  Tanahashi Katsuto (National Institute of Advanced Industrial Science and Technology, 2-2-9 Machiikedai, Koriyama, Fukushima 963-0298 Japan) ,  Takato Hidetaka (National Institute of Advanced Industrial Science and Technology, 2-2-9 Machiikedai, Koriyama, Fukushima 963-0298 Japan) ,  Yamaguchi Katsuhiko (Fukushima University, 1 Kanayagawa, Fukushima, Fukushima 960-1296 Japan)
Material： AIP Conference Proceedings  (AIP Conf Proc)
Volume： 2147  Issue： 1  Page： 140012-140012-4  Publication year： 2019 
JST Material Number： D0071C  ISSN： 0094-243X  Document type： Proceedings
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Abstract/Point： Dissolved oxygen concentration...

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Thesaurus term： spectrum ,  *infrared radiation ,  pretreatment ,  *dissolved oxygen ,  chemical mechanical polishing ,  *oxygen concentration ,  IR absorption ,  *concentration of dissolved oxygen ,  *Si wafer ,  *attenuated total reflection ,  machining
Semi thesaurus term： 定量的評価 , 【Automatic Indexing@JST】

JST classification (3)： Mechanical properties  (YH02022L) ,  Basic research of pharmacology of crude drugs  (GX06020J) ,  Fillers,reinforcement  (YH05030J)

Terms in the title (5)： 赤外 ,  減衰全反射 ,  シリコンウエハ ,  溶存酸素濃度 ,  評価