Art

J-GLOBAL ID：201902239237854130   Reference number：19A2835024

Room temperature atomic layer deposition of niobium oxide using plasma excited humidified argon and its application to anticorrosion to hydrochloric acid

プラズマ励起加湿アルゴンを用いた酸化ニオブの室温原子層堆積とその塩酸への応用【JST・京大機械翻訳】

Author (8)： Yoshida Kazuki (Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan) ,  Tokoro Kentaro (Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan) ,  Kanomata Kensaku (Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan) ,  Miura Masanori (Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan) ,  Saito Kentaro (Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan) ,  Ahmmad Bashir (Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan) ,  Kubota Shigeru (Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan) ,  Hirose Fumihiko (Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan)
Material： Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films  (Journal of Vacuum Science and Technology. A. Vacuum, Surfaces, and Films)
Volume： 37  Issue： 6  Page： 060901-060901-6  Publication year： 2019 
JST Material Number： C0789B  ISSN： 0734-2101  CODEN： JVTAD6  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Abstract/Point： Room temperature (RT) atomic l...

Register(free) or Log In to access     To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=19A2835024&from=J-GLOBAL&jstjournalNo=C0789B") }}

Thesaurus term： corrosion prevention ,  infrared reflection absorption spectroscopy ,  *excitation(physics) ,  *oxidation ,  reaction mechanism ,  monitor ,  *humidifying ,  X-ray photoelectron spectroscopy ,  *hydrochloric acid ,  vapor deposition ,  precursor(substance) ,  *argon ,  spectrophotometry(analysis) ,  *plasma ,  *niobium oxide

JST classification (1)： Oxide thin films  (BK14050P)

Terms in the title (9)： プラズマ ,  励起 ,  加湿 ,  アルゴン ,  酸化ニオブ ,  室温 ,  原子層堆積 ,  塩酸 ,  応用