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J-GLOBAL ID：201902256502028832   Reference number：19A1309988

Atomistic investigation on the initial stage of growth and interface formation of Fe on H-terminated Si(111)-(1 × 1) surface

H終端Si(111)-(1×1)表面上のFeの成長と界面形成の初期段階に関する原子論的研究【JST・京大機械翻訳】

Author (3)： Kawaguchi Ryo (Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan) ,  Eguchi Toyoaki (Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan) ,  Suto Shozo (Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan)
Material： Surface Science  (Surface Science Letters)
Volume： 686  Page： 52-57  Publication year： 2019 
JST Material Number： C0129B  ISSN： 0039-6028  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Abstract/Point： The initial growth process of ...

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Thesaurus term： substrate (plate) ,  cluster ,  nanocluster ,  thin film growth ,  thin film ,  *interface (surface) ,  *Iron ,  scanning tunneling microscope ,  *Silicon(111) ,  Schottky Junction ,  substrate surface ,  atomic-scale ,  early stage growth ,  hydrogen terminated
Semi thesaurus term： ナノファセット , 【Automatic Indexing@JST】

Author keywords (6)： Iron ,  H-terminated Si(111) ,  Thin film growth ,  Nanocluster ,  Local band bending ,  Scanning tunneling microscopy and spectroscopy

JST classification (2)： Study of adsorption by physical means  (CB12043P) ,  Surface structure of metals  (BK15020P)

Terms in the title (7)： 終端 ,  Si ,  Fe ,  成長 ,  界面 ,  初期段階 ,  研究