Art

J-GLOBAL ID：201902272197860235   Reference number：19A1942119

Hydrogen-free fluorinated DLC films with high hardness prepared by using T-shape filtered arc deposition system

T形状フィルタ付アーク堆積システムを用いて調製した高硬度の水素フリーフッ素化DLC膜【JST・京大機械翻訳】

Author (13)： Imai Takahiro (Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, Toyohashi, Aichi, 441-8580, Japan) ,  Harigai Toru (Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, Toyohashi, Aichi, 441-8580, Japan) ,  Tanimoto Tsuyoshi (Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, Toyohashi, Aichi, 441-8580, Japan) ,  Isono Ryo (Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, Toyohashi, Aichi, 441-8580, Japan) ,  Iijima Yushi (Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, Toyohashi, Aichi, 441-8580, Japan) ,  Suda Yoshiyuki (Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, Toyohashi, Aichi, 441-8580, Japan) ,  Takikawa Hirofumi (Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, Toyohashi, Aichi, 441-8580, Japan) ,  Kamiya Masao (Technology Development Department, Itoh Optical Industrial Co., Ltd., Gamagori, Aichi, 443-0041, Japan) ,  Taki Makoto (Research and Development Office, Onward Ceramic Coating Co., Ltd., Nomi, Ishikawa, 929-0111, Japan) ,  Hasegawa Yushi (Research and Development Office, Onward Ceramic Coating Co., Ltd., Nomi, Ishikawa, 929-0111, Japan) ,  Kaneko Satoru (Electronics Engineering Department, Kanagawa Institute of Industrial Science and Technology, Ebina, Kanagawa, 243-0435, Japan) ,  Kunitsugu Shinsuke (Department of Research and Development, Industrial Technology Center of Okayama Prefecture, Kita, Okayama, 701-1296, Japan) ,  Ito Mikio (Department of Chemical Science and Engineering, National Institute of Technology, Tokyo College, Hachioji, Tokyo, 193-0997, Japan)
Material： Vacuum
Volume： 167  Page： 536-541  Publication year： 2019 
JST Material Number： E0347A  ISSN： 0042-207X  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Abstract/Point： Fluorinated diamond-like carbo...

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Thesaurus term： cathode ,  adhesive strength ,  *fluorination ,  silicon ,  surface quality ,  substrate(plate) ,  diamond-like carbon ,  elastic modulus ,  *DLC film ,  *arc discharge ,  nanoindentation ,  *filter ,  *hardness ,  adhesion(bond) ,  aliphatic fluorine compound

Author keywords (5)： Diamond-like carbon ,  Fluorinated diamond-like carbon ,  Cathodic arc discharge ,  Physical vapor deposition ,  Film property

JST classification (2)： Thin films of other inorganic compounds  (BK14060A) ,  Mechanical properties of solids in general  (BL01021C)

Terms in the title (8)： T形状 ,  アーク ,  堆積システム ,  調製 ,  高硬度 ,  水素 ,  フッ素化 ,  DLC膜