Art
J-GLOBAL ID:201902274624450036   Reference number:19A1903209

Hydrogen concentration at a-Si:H/c-Si heterointerfaces-The impact of deposition temperature on passivation performance

a-Si:H/c-Siヘテロ界面における水素濃度 不動態化性能に及ぼす堆積温度の影響【JST・京大機械翻訳】
Author (7):
Material:
Volume:Issue:Page: 075115-075115-7  Publication year: 2019 
JST Material Number: U7121A  ISSN: 2158-3226  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
Abstract/Point:
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We studied the effect of depos...
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JST classification (3):
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Magnetic properties of metals  ,  Convective and radiative heat transfer  ,  Plasma diagnostics 
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