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J-GLOBAL ID:201902284441913309   Reference number:19A2550467

Preparation of Atomically Thin NbSe2 Layers by Selenizing Nb Films

Nb膜のセレン化によるNbSe2薄層の調製
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Volume: 56th  Page: 78  Publication year: Mar. 02, 2019 
JST Material Number: L1472A  Document type: Proceedings
Article type: 短報  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Salts  ,  Semiconductor thin films  ,  Applications of electron beams and ion beams 
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