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J-GLOBAL ID:201902290228982891   Reference number:19A1376328

Si基板上に形成した擬ギャップε-CoSi薄膜の熱電性能評価

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Material:
Volume: 66th  Page: ROMBUNNO.11p-W834-13  Publication year: Feb. 25, 2019 
JST Material Number: Y0054B  ISSN: 2436-7613  Document type: Proceedings
Article type: 短報  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Semiconductor thin films 
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