Art

J-GLOBAL ID：201902294208313674   Reference number：19A0098712

Analysis of Tip Stability in Adhesion Process in AFM Using Potential Energy Surface: Stability Versus Dissipation

ポテンシャルエネルギー面を用いたAFMにおける接着過程の先端安定性の解析: 安定性対散逸

Author (3)： Senda Yasuhiro (Department of Applied Science, Yamaguchi University) ,  Blomqvist Janne (COMP Centre of Excellence, Department of Applied Physics, Aalto University) ,  Nieminen Risto (COMP Centre of Excellence, Department of Applied Physics, Aalto University)
Material： e-Journal of Surface Science and Nanotechnology (Web)  (表面科学とナノテクノロジー)
Volume： 16  Page： 132-136(J-STAGE)  Publication year： 2018 
JST Material Number： U0016A  ISSN： 1348-0391  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *atomic force microscope ,  adhesion (bond) ,  *probe ,  arrangement ,  *stability analysis ,  reconstitution ,  irreversibility ,  computation model ,  energy dissipation ,  Computer Simulation ,  *contact analysis ,  chemical bond strength ,  *Non-contact atomic force microscope ,  computer application ,  utilization
Semi thesaurus term： AFM (microscope) ,  *AFM tip ,  bond strength ,  atomic configuration ,  *noncontact atomic force microscope

Author keywords (4)： Computer simulation ,  Atomic force microscopy ,  Adhesion ,  Energy dissipation

JST classification (2)： Optical instruments and techniques in general  (BD07010S) ,  Microscopy determination of structures  (BK01040E)

Reference (30)：

• [1] S. Morita, R. Wiesendanger, and E. Meyer (Eds.), Noncontact Atomic Force Microscopy (Springer, Berlin, Heidelberg, 2002). https://doi.org/10.1007/978-3-642-56019-4
• [2] B. Anczykowski, B. Gotsmann, H. Fuchs, J. P. Cleveland, and V. B. Elings, Appl. Surf. Sci. 140, 376 (1999). https://doi.org/10.1016/S0169-4332(98)00558-3
• [3] R. Bennewitz, A. S. Foster, L. N. Kantorovich, M. Bammerlin, C. Loppacher, S. Schär, M. Guggisberg, E. Meyer, and A. L. Shluger, Phys. Rev. B 62, 2074 (2000). https://doi.org/10.1103/PhysRevB.62.2074
• [4] C. Loppacher, R. Bennewitz, O. Pfeiffer, M. Guggisberg, M. Bammerlin, S. Schär, V. Barwich, A. Baratoff, and E. Meyer, Phys. Rev. B 62, 13674 (2000). https://doi.org/10.1103/PhysRevB.62.13674
• [5] T. Fukuma, K. Umeda, K. Kobayashi, H. Yamada, and K. Matsushige, Jpn. J. Appl. Phys. 41, 4903 (2002). https://doi.org/10.1143/JJAP.41.4903

Terms in the title (6)： ポテンシャルエネルギー面 ,  AFM ,  接着過程 ,  安定性 ,  解析 ,  散逸