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J-GLOBAL ID：202002217555384807   Reference number：20A0634282

Vapor-deposited Au thin films modified by plasma etching for surface-enhanced Raman scattering active substrates

表面増強Raman散乱活性基板のためのプラズマエッチングにより修飾した蒸着Au薄膜【JST・京大機械翻訳】

Author (4)： Kondo Takahiro (Department of Chemistry, Faculty of Science, Gakushuin University, Mejiro 1-5-1, Toshima-ku, Tokyo 171-8588, Japan) ,  Tomida Akira (Department of Chemistry, Faculty of Science, Gakushuin University, Mejiro 1-5-1, Toshima-ku, Tokyo 171-8588, Japan) ,  Morishita Nanaka (Department of Chemistry, Faculty of Science, Gakushuin University, Mejiro 1-5-1, Toshima-ku, Tokyo 171-8588, Japan) ,  Saito Yuika (Department of Chemistry, Faculty of Science, Gakushuin University, Mejiro 1-5-1, Toshima-ku, Tokyo 171-8588, Japan)
Material： Journal of Applied Physics  (Journal of General Physics and its Application to Other Sciences and to Industry)
Volume： 127  Issue： 9  Page： 093105-093105-8  Publication year： 2020 
JST Material Number： C0266A  ISSN： 0021-8979  CODEN： JAPIAU  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Abstract/Point： Surface-enhanced Raman scatter...

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Thesaurus term： *gold ,  surface enhanced Raman scattering spectroscopy ,  *plasma etching ,  *vapor deposition ,  *surface enhanced Raman spectroscopy ,  electric field ,  active site ,  *thin film growth ,  film thickness ,  electromagnetic field ,  island structure ,  atomic force microscope ,  *thin film ,  high sensitivity ,  micro structure
Semi thesaurus term： ナノスケール , 【Automatic Indexing@JST】

JST classification (1)： Metallic thin films  (BK14030T)

Terms in the title (7)： 表面増強Raman散乱 ,  活性基 ,  プラズマエッチング ,  修飾 ,  蒸着 ,  Au ,  薄膜