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J-GLOBAL ID：202002229222393272   Reference number：20A1517487

Effects of Pt Sacrificial Layer on Microfabrication in Layered Bismuth-based Ferroelectric Thin Films

層状ビスマス系強誘電体薄膜の微細加工に及ぼすPt犠牲層の影響

Author (8)： Obayashi Taiki (Department of Chemical Engineering and Materials Science, Graduate School of Engineering, University of Hyogo) ,  Kobune Masafumi (Department of Chemical Engineering and Materials Science, Graduate School of Engineering, University of Hyogo) ,  Matsunaga Takuya (Department of Chemical Engineering and Materials Science, Graduate School of Engineering, University of Hyogo) ,  Ito Ryo (Department of Chemical Engineering and Materials Science, Graduate School of Engineering, University of Hyogo) ,  Migita Tsubasa (Department of Chemical Engineering and Materials Science, Graduate School of Engineering, University of Hyogo) ,  Kikuchi Takeyuki (Department of Chemical Engineering and Materials Science, Graduate School of Engineering, University of Hyogo) ,  Kanda Kensuke (Department of Electronics and Computer Sciences, Graduate School of Engineering, University of Hyogo) ,  Maenaka Kazusuke (Department of Electronics and Computer Sciences, Graduate School of Engineering, University of Hyogo)
Material： Transactions of the Materials Research Society of Japan  (Trans Mater Res Soc Jpn)
Volume： 45  Issue： 2  Page： 31-34(J-STAGE)  Publication year： 2020 
JST Material Number： L4468A  ISSN： 1382-3469  Document type： Proceedings
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *ferroelectrics ,  *magnetic substance ,  *RIE ,  dimensional accuracy ,  thickness of strata ,  micro structure ,  layer ,  epitaxy ,  bismuth compound ,  neodymium compound ,  europium compound ,  titanate ,  thin film ,  dielectric thin film ,  platinum ,  layered compound ,  fine patterning ,  magnetoelectric effect ,  orientation(direction)
Semi thesaurus term： c-axis orientation ,  micropillar ,  microrod ,  *multi-ferroic ,  sacrificial layer ,  ferroelectric thin film

Author keywords (8)： magnetoelectric multiferroic ,  (Bi_3.25Nd_0.65Eu_0.10)Ti₃O₁₂ ,  reactive ion etching ,  Pt sacrificial layer ,  magnetoelectric multiferroic ,  (Bi_3.25Nd_0.65Eu_0.10)Ti₃O₁₂ ,  reactive ion etching ,  Pt sacrificial layer

JST classification (2)： Ferroelectrics,antiferroelectrics and ferroelasticity  (BM05030B) ,  Manufacturing technology of solid-state devices  (NC03030V)

Reference (19)：

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Terms in the title (6)： 層状 ,  ビスマス ,  強誘電体薄膜 ,  微細加工 ,  Pt ,  犠牲層