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J-GLOBAL ID：202002265671149960   Reference number：20A0577337

Effect of internal stress on short-circuit diffusion in thin films and nanolaminates: Application to Cu/W nano-multilayers

薄膜とナノラミネートにおける短絡拡散に及ぼす内部応力の影響:Cu/Wナノ多層への応用【JST・京大機械翻訳】

Author (11)： Druzhinin Aleksandr V. (Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Joining Technologies and Corrosion, UEberlandstrasse 129, Duebendorf CH-8600, Switzerland) ,  Druzhinin Aleksandr V. (National University of Science and Technology ≪MISIS≫, Leninsky Prospect 4, Moscow 119049, Russian Federation) ,  Druzhinin Aleksandr V. (Institute of Solid State Physics and Chernogolovka Scientific Center, Russian Academy of Sciences, Moscow District, Academician Ossipyan Str., Chernogolovka 142432, Russian Federation) ,  Rheingans Bastian (Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Joining Technologies and Corrosion, UEberlandstrasse 129, Duebendorf CH-8600, Switzerland) ,  Siol Sebastian (Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Joining Technologies and Corrosion, UEberlandstrasse 129, Duebendorf CH-8600, Switzerland) ,  Straumal Boris B. (National University of Science and Technology ≪MISIS≫, Leninsky Prospect 4, Moscow 119049, Russian Federation) ,  Straumal Boris B. (Institute of Solid State Physics and Chernogolovka Scientific Center, Russian Academy of Sciences, Moscow District, Academician Ossipyan Str., Chernogolovka 142432, Russian Federation) ,  Straumal Boris B. (Karlsruhe Institute of Technology (KIT), Institute of Nanotechnology, Hermann-von-Helmholtz-Platz 1, Eggenstein-Leopoldshafen 76344, Germany) ,  Janczak-Rusch Jolanta (Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Joining Technologies and Corrosion, UEberlandstrasse 129, Duebendorf CH-8600, Switzerland) ,  Jeurgens Lars P.H. (Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Joining Technologies and Corrosion, UEberlandstrasse 129, Duebendorf CH-8600, Switzerland) ,  Cancellieri Claudia (Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Joining Technologies and Corrosion, UEberlandstrasse 129, Duebendorf CH-8600, Switzerland)
Material： Applied Surface Science  (Appl Surf Sci)
Volume： 508  Page： Null  Publication year： 2020 
JST Material Number： B0707B  ISSN： 0169-4332  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Abstract/Point： The stability, reactivity and ...

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Thesaurus term： diffusion coefficient ,  X-ray diffraction ,  grain boundary diffusion ,  *copper ,  *internal stress ,  compressive stress ,  annealing(heat treatment) ,  grain boundary ,  X-ray diffractometry ,  low temperature ,  interface(surface) ,  activation energy ,  diffusion velocity ,  *thin film ,  nanomaterial ,  residual stress

Author keywords (5)： Grain boundary diffusion ,  Internal stress ,  Auger electron spectroscopy ,  Nano-multilayers ,  Hwang-Balluffi model

JST classification (1)： Diffusion in metals  (BL06022C)

Terms in the title (8)： 薄膜 ,  ナノラミネート ,  短絡 ,  拡散 ,  内部応力 ,  Cu ,  多層 ,  応用