Art

J-GLOBAL ID：202002288240737697   Reference number：20A2325671

Photochemical addition of cyclic ethers/acetals to olefins using ^t BuOO ^t Bu: Synthesis of masked ketones/aldehydes and diols

t-BuOO*=tBuを用いるオレフィンへの環状エーテル/アセタールの光化学的付加 マスクされたケトン/アルデヒドおよびジオールの合成【JST・京大機械翻訳】

Author (13)： Hayakawa Mamiko (Department of Materials and Applied Chemistry, College of Science and Technology, Nihon University, Kanda-Surugadai, Chiyoda-ku, Tokyo, 101-8308, Japan) ,  Shimizu Rina (Department of Materials and Applied Chemistry, College of Science and Technology, Nihon University, Kanda-Surugadai, Chiyoda-ku, Tokyo, 101-8308, Japan) ,  Omori Hajime (Department of Materials and Applied Chemistry, College of Science and Technology, Nihon University, Kanda-Surugadai, Chiyoda-ku, Tokyo, 101-8308, Japan) ,  Shirota Hisashi (Department of Materials and Applied Chemistry, College of Science and Technology, Nihon University, Kanda-Surugadai, Chiyoda-ku, Tokyo, 101-8308, Japan) ,  Uchida Kou (Department of Materials and Applied Chemistry, College of Science and Technology, Nihon University, Kanda-Surugadai, Chiyoda-ku, Tokyo, 101-8308, Japan) ,  Mashimo Hiroshi (Department of Materials and Applied Chemistry, College of Science and Technology, Nihon University, Kanda-Surugadai, Chiyoda-ku, Tokyo, 101-8308, Japan) ,  Xu Han (Department of Materials and Applied Chemistry, College of Science and Technology, Nihon University, Kanda-Surugadai, Chiyoda-ku, Tokyo, 101-8308, Japan) ,  Yamada Ryuusei (Department of Materials and Applied Chemistry, College of Science and Technology, Nihon University, Kanda-Surugadai, Chiyoda-ku, Tokyo, 101-8308, Japan) ,  Niino Seiya (Department of Materials and Applied Chemistry, College of Science and Technology, Nihon University, Kanda-Surugadai, Chiyoda-ku, Tokyo, 101-8308, Japan) ,  Wakame Yoshiki (Department of Materials and Applied Chemistry, College of Science and Technology, Nihon University, Kanda-Surugadai, Chiyoda-ku, Tokyo, 101-8308, Japan) ,  Liu Chuanxiang (National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki, 305-8565, Japan) ,  Aoyama Tadashi (Department of Materials and Applied Chemistry, College of Science and Technology, Nihon University, Kanda-Surugadai, Chiyoda-ku, Tokyo, 101-8308, Japan) ,  Ouchi Akihiko (Department of Materials and Applied Chemistry, College of Science and Technology, Nihon University, Kanda-Surugadai, Chiyoda-ku, Tokyo, 101-8308, Japan)
Material： Tetrahedron  (Tetrahedron Symposia-in-Print)
Volume： 76  Issue： 44  Page： Null  Publication year： 2020 
JST Material Number： E0234A  ISSN： 0040-4020  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Abstract/Point： A fast photochemical C-C bond ...

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Thesaurus term： Hydrolysis ,  *acetal ,  *alkene ,  *aldehyde ,  *ether ,  *ketone ,  *cyclic ether ,  *Photochemistry ,  *diol ,  bond formation

Author keywords (6)： Photochemical reaction ,  C-C bond formation ,  Radical ,  Ether ,  Acetal ,  Olefin

JST classification (4)： Aromatic monocyclic ketones  (CF05170I) ,  Stereochemistry of organic reaction  (CF02130V) ,  Photochemical reaction,radical reaction  (CF02090A) ,  Oxazoles,isoxazoles  (CF07080Y)

Terms in the title (8)： オレフィン ,  環状エーテル ,  アセタール ,  光化学 ,  マスク ,  ケトン ,  アルデヒド ,  ジオール