Rchr
J-GLOBAL ID：202101005314638617
Update date: Feb. 01, 2024
Hamano Takashi
ハマノ タカシ | Hamano Takashi
Affiliation and department：
Research theme for competitive and other funds (1)：
- 2020 - 2023 A study of plasma-material atomistic-scale interactions based on stochastic theory and optimal control of material properties
Papers (4)：
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Takashi Hamano, Takayuki Matsuda, Yuya Asamoto, Masao Noma, Shigehiko Hasegawa, Michiru Yamashita, Keiichiro Urabe, Koji Eriguchi. Spectroscopic ellipsometry characterization of boron nitride films synthesized by a reactive plasma-assisted coating method. Applied Physics Letters. 2022. 120. 3. 031904-031904
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Koji Eriguchi, Takashi Hamano, Keiichiro Urabe. Improvement of the plasma-induced defect generation model in Si substrates and the optimization design framework. Plasma Processes and Polymers. 2019. 16. 9. 1900058-1900058
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Takashi Hamano, Keiichiro Urabe, Koji Eriguchi. Investigation of spatial and energy profiles of plasma process-induced latent defects in Si substrate using capacitance-voltage characteristics. Journal of Physics D: Applied Physics. 2019
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Takashi Hamano, Koji Eriguchi. Incident ion dose evolution of damaged layer thickness in Si substrate exposed to Ar and He plasmas. Japanese Journal of Applied Physics. 2018. 57. 6S2. 06JD02-06JD02
MISC (3)：
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T. Matsuda, T. Hamano, Y. Asamoto, M. Noma, M. Yamashita, S. Hasegawa, K. Urabe, K. Eriguchi. Ion irradiation-induced sputtering and surface modification of BN films prepared by a reactive plasma-assisted coating technique. Japanese Journal of Applied Physics. 2022. 61. SI
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松田崇行, 濱野誉, 朝本雄也, 野間正男, 山下満, 長谷川繁彦, 占部継一郎, 江利口浩二. Structural Design of Boron Nitride Films Using Ion-Flux Controlling Reactive Plasma-Assisted Coating (RePAC) Technique. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2021. 82nd
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朝本雄也, 松田崇行, 濱野誉, 野間正男, 長谷川繁彦, 山下満, 占部継一郎, 江利口浩二. Control of Ion Flux to the Substrate in Material Processing with a Vacuum-Arc Discharge Considering Discharge Current Limitation Mechanisms. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2021. 82nd
Lectures and oral presentations (3)：
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電気容量解析に基づくSi基板内のプラズマプロセス誘起欠陥のギャップ内準位分布予測
(第68回応用物理学会春季学術講演会 2021)
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Effects of Variability in Plasma-Induced Damage to Si Substrate on Device Performance and Its Application to Variability Assessment Methodology
(第20回 関西コロキアム電子デバイスワークショップ 2020)
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過渡的プラズマダメージ形成過程を考慮したプロセスデザインの検討
(応用物理学会シリコンテクノロジー分科会 第215回研究集会 2019)
Education (3)：
- 2020 - 現在 Kyoto University
- 2018 - 2020 Kyoto University
- 2014 - 2018 Kyoto University Faculty of Engineering School of Engineering Science
Work history (1)：
- 2020/04 - 現在 日本学術振興会 特別研究員DC1
Awards (7)：
Association Membership(s) (1)：
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