Ogura Yuzuru

Research field (4)： Manufacturing and production engineering , Manufacturing and production engineering , Chemical reaction and process system engineering , Inorganic materials

Research keywords (5)：セラミックス , 3Dプリンター , 成膜プロセス , 耐酸化被覆 , 金属

Papers (13)：

Noriko Watari, Yuzuru Ogura, Noriko Yamazaki, Yukihiko Inoue, Keisuke Kamitani, Yasuyuki Fujiya, Masahiko Toyoda, Saneyuki Goya, Toshiya Watanabe. Two-fluid model to simulate metal powder bed fusion additive manufacturing. Journal of Fluid Science and Technology. 2018. 13. 2
Yuzuru Ogura, Yutaka Osada, Shinya Matsuo, Miho Amada, Mai Kamata, Hiroshi Onoda. Bottom-up via filling by Metal Chloride Reduction Chemical Vapor Deposition (MCR-CVD). Advanced Metallization Conference (AMC). 2008. 237-243
Naoki Oyama, Yuzuru Ogura, Yoshihiko Mitake, Yugo Tomita, Hitoshi Sakamoto, Shinichi Nagase, Masaru Watanabe, Naoto Fujiwara, Shigetoshi Ohshima, Fumihiko Hirose. Low-temperature fabrication of nickel silicide metal oxide semiconductor capacitors at 280°C by metal chloride reduction chemical vapor deposition. Japanese Journal of Applied Physics, Part 2: Letters. 2007. 46. 20-24
Yuzuru Ogura, Chikako Kobayashi, Yoshiyuki Ooba, Naoki Yahata, Hitoshi Sakamoto. Low temperature deposition of metal films by metal chloride reduction chemical vapor deposition. Surface and Coatings Technology. 2006. 200. 10 SPEC. ISS. 3347-3350
Yuzuru Ogura, Chikako Kobayashi, Yoshiyuki Ooba, Hitoshi Sakamoto, Naoki Yahata, Toshihiko Nishimori. Metal Chloride Reduction Chemical Vapor Deposition for Ta, Mo and Ir Films. Japanese Journal of Applied Physics, Part 2: Letters. 2004. 43. 1 A/B

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MISC (15)：

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Books (1)：

Ceramic Gas Turbine Component Development And Characterization
American Society of Mechanical Engineers 2003

Education (1)：

1982 - 1989 Nagoya University School of Science Department of Physics

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