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ArticleJ-GLOBAL ID:200902000105784084整理番号:81A0313375

Internal stresses in amorphous silicon films deposited by cylindrical magnetron sputtering using Ne,Ar,Kr,Xe, and Ar+H2.

Ne,Ar,Kr,XeおよびAr+H2を用いて円筒型マグネトロンスパッタリングによって蒸着した無定形シリコン膜の内部応力

著者:THORNTON J A(Telic Corp., California)、HOFFMAN D W(Ford Motor Co., Michigan)
資料名:J Vac Sci Technol 巻:18 号:2 ページ:203-207
発行年:1981年03月
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