Internal stresses in amorphous silicon films deposited by cylindrical magnetron sputtering using Ne,Ar,Kr,Xe, and Ar+H<sub>2</sub>.

THORNTON J A; HOFFMAN D W

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J-GLOBAL ID：200902000105784084 Reference number：81A0313375

Internal stresses in amorphous silicon films deposited by cylindrical magnetron sputtering using Ne,Ar,Kr,Xe, and Ar+H₂.

Ne,Ar,Kr,XeおよびAr+H₂を用いて円筒型マグネトロンスパッタリングによって蒸着した無定形シリコン膜の内部応力

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Author (2)： ,
Material：
Volume： 18 Issue： 2 Page： 203-207 Publication year： Mar. 1981
JST Material Number： C0789A ISSN： 0022-5355 CODEN： JVSTAL Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Semiconductor thin films , Mechanical properties of solids in general

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Internal stresses in amorphous silicon films deposited by cylindrical magnetron sputtering using Ne,Ar,Kr,Xe, and Ar+H2.

Internal stresses in amorphous silicon films deposited by cylindrical magnetron sputtering using Ne,Ar,Kr,Xe, and Ar+H₂.