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ArticleJ-GLOBAL ID:200902000160305063整理番号:88A0510358

Formation and thermal stability of amorphous Cu-Zr thin films deposited by coevaporation.

共蒸着法による非晶質Cu‐Zr薄膜の形成と熱安定性

著者:MINEMURA T(Philips Research Lab., Eindhoven, NLD)、VAN DEN BROEK J J(Philips Research Lab., Eindhoven, NLD)、DAAMS J L C(Philips Research Lab., Eindhoven, NLD)
資料名:J Appl Phys 巻:63 号:9 ページ:4426-4430
発行年:1988年05月01日
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