Plasma enhancement in direct nitridation of silicon and silicon-dioxide.

ITO T; KATO I; ISHIKAWA H

Art

J-GLOBAL ID：200902000185661719 Reference number：87A0072919

Plasma enhancement in direct nitridation of silicon and silicon-dioxide.

シリコンおよび二酸化シリコンの直接窒化のプラズマによる助長

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Author (3)： , ,
Material：
Page： 473-485 Publication year： 1985
JST Material Number： K19860621 ISBN： 0-931837-03-0 Document type： Proceedings
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Applications of plasma

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