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ArticleJ-GLOBAL ID:200902001920963313整理番号:81A0049181

Characteristics of Nb thin film microbridges fabricated by electron-beam lithography.

電子ビームリソグラフィーで作った薄膜Nbマイクロブリッジの特性

著者:SHIRAFUJI J、MATSUI S、HIDA H・・・
資料名:Technol Rep Osaka Univ 巻:30 号:1551-1582 ページ:491-495
発行年:1980年10月
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