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J-GLOBAL ID:200902002037450485   Reference number:81A0164122

Localized state distribution in amorphous-silicon-based alloys using the field effect technique.

電界効果法によるアモルファスSi合金中の局在化状態密度
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Volume:Issue:Page: 277-288  Publication year: Nov. 1980 
JST Material Number: A0747B  ISSN: 0379-6787  Document type: Article
Article type: 原著論文  Country of issue: Switzerland (CHE)  Language: ENGLISH (EN)
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Electric conduction in amorphous and liquid semiconductors 
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