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ArticleJ-GLOBAL ID:200902015542354207整理番号:92A0808912

同軸線路型MPCVD装置におけるN2/SiH4プラズマのプラズマパラメータの空間分布測定 (II)

Measurement of Plasma Parameters in N2/SiH4 Plasma of Coaxial Line Type MPCVD System. (II).

著者:下田毅(早稲田大)、加藤勇(早稲田大)
資料名:応用物理学会学術講演会講演予稿集 巻:53rd 号:1 ページ:37
発行年:1992年09月
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About J-GLOBAL

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