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J-GLOBAL ID:200902018986443051   Reference number:86A0425090

In situ characterization of nucleation, growth, and composition of ion-assisted films by ellipsometry, reflectance-transmittance measurements, and ion-scattering spectroscopy.

分光偏光解析法,反射率-透過率測定,およびイオン散乱分析法によるイオン応用蒸着膜の核生成,成長,および組成のその場評価
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Volume:Issue: 3 Pt 1  Page: 463-464  Publication year: May. 1986 
JST Material Number: C0789B  ISSN: 0734-2101  CODEN: JVTAD6  Document type: Article
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Techniques and equipment of thin film deposition  ,  Interactions with ions 

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