Reactive Ion Etching Using Electron Cyclotron Resonance Hydrogen Plasma with n-Butyl Acetate Reactive Gas.

MIYATA T; MINAMI T; SATO H; TAKATA S

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J-GLOBAL ID：200902051330269125 Reference number：92A0287630

Reactive Ion Etching Using Electron Cyclotron Resonance Hydrogen Plasma with n-Butyl Acetate Reactive Gas.

電子サイクロトロン共鳴水素プラズマと酢酸ブチル反応ガスを用いた反応性イオンエッチング

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Material：
Volume： 31 Issue： 3 Page： 932-937 Publication year： Mar. 1992
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Applications of plasma , Display equipment , Manufacturing technology of solid-state devices

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