Direct sub-micron microstructuring on cylinder using TiO<sub>2</sub> sol-gel process and radial phase mask based lithography

BERTHOD L.; BERTHOD L.; BERTHOD L.; VOCANSON F.; LANGLET M.; LANGLET M.; VEILLAS C.; REYNAUD S.; VERRIER I.; LAUKKANEN J.; PARRIAUX O.; JOURLIN Y.

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J-GLOBAL ID：201702219962968170 Reference number：17A0083660

Direct sub-micron microstructuring on cylinder using TiO₂ sol-gel process and radial phase mask based lithography

TiO₂ゾルゲル処理および動径位相マスクベースリソグラフィーを用いた円筒上での直接サブミクロン微細構造形成

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Material：
Volume： 9888 Page： 988808.1-988808.8 Publication year： 2016
JST Material Number： D0943A ISSN： 0277-786X CODEN： PSISDG Document type： Proceedings
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Optical devices in general , Manufacturing technology of solid-state devices

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Direct sub-micron microstructuring on cylinder using TiO2 sol-gel process and radial phase mask based lithography

Direct sub-micron microstructuring on cylinder using TiO₂ sol-gel process and radial phase mask based lithography