Art

J-GLOBAL ID：201702238290631114   Reference number：17A0351861

Effect of Substrate Temperature on Microstructures and Optical Properties of a-Si: H Coatings Grown by Ion BeamAssisted Sputtering

A-SI:H薄膜の構造特性に及ぼす基板温度の影響を研究した。【JST・京大機械翻訳】

Author (9)： Huang Junjun (Department of Chemical and Materials Engineering,Hefei College, Chinese Academy of Sciences,Key Laboratory of Materials for Energy Conversion) ,  Cheng Wei (Department of Chemical and Materials Engineering,Hefei College) ,  Ding Ming (Department of Chemical and Materials Engineering,Hefei College) ,  Wang Hui (Hefei Lucky & Technology Industry Co. Ltd) ,  Gao Min (Department of Chemical and Materials Engineering,Hefei College) ,  Sang Anqi (Department of Chemical and Materials Engineering,Hefei College) ,  Ge Tianyu (Department of Chemical and Materials Engineering,Hefei College) ,  Tan Yongzhen (Department of Chemical and Materials Engineering,Hefei College) ,  Chen Zhenming (Hezhou University,College of Chemistry and Bioengineering)
Material： Zhenkong Kexue yu Jishu Xuebao  (Journal of Vacuum Science and Technology)
Volume： 36  Issue： 12  Page： 1368-1372  Publication year： 2016 
JST Material Number： C2159A  ISSN： 1672-7126  CODEN： CKKSDV  Document type： Article
Article type： 原著論文  Country of issue： China (CHN)  Language： CHINESE (ZH)

Abstract/Point： The hydrogenated amorphous sil...

Register(free) or Log In to access     To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=17A0351861&from=J-GLOBAL&jstjournalNo=C2159A") }}

Thesaurus term： magnetron sputtering ,  optical gap ,  spectrometer ,  *structural property ,  hydrogen ,  spectroscopy ,  degree of order ,  *substrate temperature ,  optimization ,  ion ,  micro structure ,  elliptically polarized light ,  *thin film ,  absorption coefficient
Semi thesaurus term： 原子比 , 【Automatic Indexing@JST】

Author keywords (4)： Hydrogen-ion-beam-assisted sputtering ,  Amorphous silicon thin films ,  Structure ,  Substrate temperature

JST classification (2)： Semiconductor thin films  (BK14040E) ,  Oxide thin films  (BK14050P)

Terms in the title (4)： 薄膜 ,  構造特性 ,  基板温度 ,  研究