Cost-effective and large-area process for the functionalization and surface microstructuring using photo-patternable TiO<sub>2</sub> sol-gel process and colloidal photolithography

BERTHOD L.; BERTHOD L.; SHAVDINA O.; SHAVDINA O.; VOCANSON F.; LANGLET M.; DELLEA O.; VEILLAS C.; REYNAUD S.; VERRIER I.; JOURLIN Y.

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J-GLOBAL ID：201702239510605840 Reference number：17A0083658

Cost-effective and large-area process for the functionalization and surface microstructuring using photo-patternable TiO₂ sol-gel process and colloidal photolithography

光パターン形成可能なTiO₂ゾル-ゲル過程およびコロイダルフォトリソグラフィーを用いた官能化および表面微細構造形成に対するコスト効果的な大面積加工

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Material：
Volume： 9888 Page： 988805.1-988805.8 Publication year： 2016
JST Material Number： D0943A ISSN： 0277-786X CODEN： PSISDG Document type： Proceedings
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Oxide thin films , Manufacturing technology of solid-state devices

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Cost-effective and large-area process for the functionalization and surface microstructuring using photo-patternable TiO2 sol-gel process and colloidal photolithography

Cost-effective and large-area process for the functionalization and surface microstructuring using photo-patternable TiO₂ sol-gel process and colloidal photolithography