1. Coating technology using dynamic ion beam mixing 2. Epitaxial growth of SiC using organosilicon ion beam 3. Ion-surface reaction by ab initio molecular orbital method
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論文 (171件):
Satoru Yoshimura, Takae Takeuchi, Masato Kiuchi. Low-energy N+ ion beam induced chemical vapor deposition using tetraethyl orthosilicate, hexamethyldisiloxane, or hexamethyldigermane. AIP Advances. 2024. 14. 9
Takae Takeuchi, Takahito Suzuki, Tomoko Kimura, Masato Kiuchi. Self-inhibition of growth and allelopathy through volatile organic compounds in Fusarium solani and Aspergillus fumigatus. PLOS ONE. 2024
Satoru Yoshimura, Takae Takeuchi, Masato Kiuchi. Low-energy O+ or SiO+ ion beam induced deposition of silicon oxide using hexamethyldisiloxane. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 2024. 549. 165276-165276
Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Kensuke Murai, Masato Kiuchi. Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 2023. 1056. 168707-168707