Reduction of Pass-gate leakage by silicon-thickness thinning in double-gate MOSFEE. Silicon-on-Insulator Technology and Devices XI, the Electrochemical Society Inc. 2003. PV2003-05. 331-336
Reduction of Pass-gate leakage by silicon-thickness thinning in double-gate MOSFEE. Silicon-on-Insulator Technology and Devices XI, the Electrochemical Society Inc. 2003. PV2003-05. 331-336
学歴 (2件):
- 2000 東北大学 工学部 電子工学科
- 2000 東北大学
学位 (1件):
修士(工学) (東北大学)
所属学会 (3件):
電子情報通信学会
, Information and Communication Engineers
, The Institute of Electronics