Integration of VCSEL and Slow Light Device Using Lateral CouplingII
(The 2010 IEICE General Conference 2010)
Characterization of Process Plasma in Reactive Ion Etching Using Ar/F2
(The 57th Spring Meeting of Japan Society of Applied Physics and Related Societies 2010)
Fabrication of High Contrast Grating with Thermal Nanoimprint Process
(The 57th Spring Meeting of Japan Society of Applied Physics and Related Societies 2010)
Gating function and spot-size dispersion characteristics of slow light waveguide device
(The 57th Spring Meeting of Japan Society of Applied Physics and Related Societies 2010)
Polarization-insensitive Vertical MMI Hollow Waveguide Coupler for 3D Integrated Photonic Circuits
(The 57th Spring Meeting of Japan Society of Applied Physics and Related Societies 2010)