蓮池紀幸

ハスイケノリユキ | Noriyuki Hasuike

所属機関・部署：
職名：助教

研究分野 (1件)：結晶工学

論文 (52件)：

Hiroyuki Nishinaka, Osamu Ueda, Daisuke Tahara, Yusuke Ito, Noriaki Ikenaga, Noriyuki Hasuike, Masahiro Yoshimoto. Single-Domain and Atomically Flat Surface of κ-Ga2O3Thin Films on FZ-Grown ε-GaFeO3Substrates via Step-Flow Growth Mode. ACS Omega. 2020. 5. 45. 29585-29592
Woo Sik Yoo, Kitaek Kang, Toshikazu Ishigaki, Jung Gon Kim, Noriyuki Hasuike, Hiroshi Harima, Masahiro Yoshimoto. Thermal silicidation of Ni/SiGe and characterization of resulting nickel germanosilicides. ECS Journal of Solid State Science and Technology. 2020. 9. 12
Woo Sik Yoo, Kitaek Kang, Toshikazu Ishigaki, Jung Gon Kim, Noriyuki Hasuike, Hiroshi Harima, Masahiro Yoshimoto. Thermal silicidation of Ni/SiGe and characterization of resulting silicide films using Raman spectroscopy and X-Ray diffraction. ECS Transactions. 2020. 98. 5. 457-464
Kazuki Ohnishi, Shigeyuki Kuboya, Tomoyuki Tanikawa, Takuya Iwabuchi, Kazuya Yamamura, Noriyuki Hasuike, Hiroshi Harima, Tsuguo Fukuda, Takashi Matsuoka. Reuse of scalmgo4 substrates utilized for halide vapor phase epitaxy of gan. Japanese Journal of Applied Physics. 2019. 58. SC
Matsui Hiroaki, Hasebe Takayuki, Hasuike Noriyuki, Tabata Hitoshi. Plasmonic heat-shielding in infrared range based on oxide semiconductor nanoparitcles based on Sn-doped In2O3: The effect of particle size and interparticle gap. ACS Applied Nano Materials. 2018. 1. 4. 1853-862

MISC (9件)：

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蓮池 紀幸