Kakiuchi Hiroaki

カキウチヒロアキ | Kakiuchi Hiroaki

Affiliation and department：
Homepage URL (1)： http://www.prec.eng.osaka-u.ac.jp

Research field (2)： Electric/electronic material engineering , Thin-film surfaces and interfaces

Research theme for competitive and other funds (42)：

2017 - 2020 Formation of Nitride Nanostructures by Reaction of High Density N Radicals with Metals
2014 - 2019 Development of highly efficient formation process of thin film devices based on atmospheric-pressure plasma science
2012 - 2015 Formation process of solar grade silicon by atomic hydrogen reduction of quartz sand
2008 - 2012 Development of highly efficient fabrication process of thin film devices on plastic materials using atmospheric-pressure plasma
2010 - 超薄型結晶Si太陽電池の製造を可能とする大気圧プラズマ高速成膜技術の開発

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Papers (214)：

Toshimitsu Nomura, Hiroaki Kakiuchi, Hiromasa Ohmi. High-rate etching of silicon oxide and nitride using narrow-gap high-pressure (3.3 kPa) hydrogen plasma. Journal of Physics D: Applied Physics. 2024. 57. 27. 275204-275204
Toshimitsu Nomura, Hiroaki Kakiuchi, Hiromasa Ohmi. Role of O₂ and N₂ addition on low-reflectance Si surface formation using moderate-pressure (3.3 kPa) hydrogen plasma. Physica Scripta. 2023. 98. 11. 115609-115609
Toshimitsu Nomura, Hiroaki Kakiuchi, Hiromasa Ohmi. Shallow defect layer formation as Cu gettering layer of ultra-thin Si chips using moderate-pressure (3.3 kPa) hydrogen plasma. Journal of Applied Physics. 2023. 133. 16
Hiroaki Kakiuchi, Hiromasa Ohmi, Seiya Takeda, Kiyoshi Yasutake. Improvement of deposition characteristics of silicon oxide layers using argon-based atmospheric-pressure very high-frequency plasma. Journal of Applied Physics. 2022. 132. 10. 103302-103302
Toshimitsu Nomura, Kenta Kimoto, Hiroaki Kakiuchi, Kiyoshi Yasutake, Hiromasa Ohmi. Si nanocone structure fabricated by a relatively high-pressure hydrogen plasma in the range of 3.3-27 kPa. Journal of Vacuum Science & Technology B. 2022. 40. 3. 032801-032801

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MISC (140)：

High-Rate and Low-Temperature Si Film Growth Technology and its Application for Thin Film Transistors. 2013. 19. 11. 23-29
High-rate deposition of silicon films by atmospheric-pressure plasma chemical vapor deposition and its application to Si thin film solar cells. 2012. 31. 6. 88-93
垣内弘章, 大参宏昌, 安武潔. 大気圧プラズマを用いた低温・高速成膜技術 (特集プラズマプロセスの応用技術). ケミカルエンジニヤリング. 2010. 55. 12. 889-895
Hiromasa Ohmi, Kazuya Kishimoto, Hiroaki Kakiuchi, Kiyoshi Yasutake. PFC-free dry etching method for Si using narrow-gap VHF plasma at subatmospheric pressure. J. Electrochem. Soc.,. 2010. Vol. 157, No.2, D85
PFC-free dry etching method for Si using narrow-gap VHF plasma at subatmospheric pressure. J. Electrochem. Soc.,. 2010. Vol. 157, No.2, D85

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Patents (16)：

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Books (16)：

Atmospheric-pressure plasma technologies and their applications for thin film deposition
2014
Monthly DISPLAY
2013
大気圧プラズマCVDによるSi高速成膜と太陽電池への応用 OPTRONICS, 2012, No. 6, 88-93. (共著)
株式会社オプトロニクス社 2012
大気圧プラズマCVDによるシリコン薄膜の形成「改訂版大気圧プラズマの生成制御と応用技術」 pp.197-219, 2012 (共著)
サイエンス&テクノロジー株式会社 2012 ISBN:9784864280396
大気圧プラズマの技術とプロセス開発
シーエムシー出版 2011 ISBN:9784781304076

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Works (3)：

Education (5)：

- 1991 Osaka University Graduate School, Division of Engineering
- 1991 Osaka University
- 1991 Osaka University Graduate School, Division of Engineering
- 1989 Osaka University Faculty of Engineering
- 1989 Osaka University Faculty of Engineering Department of Precision Engineering

Professional career (2)：

Work history (10)：

2020/04/01 - 現在 Osaka University Graduate School of Engineering . Associate Professor
2001/08 - 現在大阪大学大学院工学研究科助教授
1998/04 - 現在大阪大学大学院工学研究科助手
1991/04 - 現在大阪大学工学部助手
2007/04/01 - 2020/03/31 Osaka University Graduate School of Engineering Division of Precision Science & Technology and Applied Physics Associate Professor

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Awards (5)：

2015/11 - Taiwan Association for Coatings and Thin Films Technology Poster award of excellence
2004/03 - 社団法人精密工学会精密工学会沼田記念論文賞
2003/10 - 精密工学会 2003年度精密工学会秋季大会学術講演会ベストオーガナイザー賞「機能性薄膜」
1994 - 1994年度精密工学会関西支部講演論文賞
1992/08 - 精密工学会精密工学会関西支部講演論文賞

Association Membership(s) (2)：

The Japan Society of Applied Physics , The Japan Society for Precision Engineering

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