Yoshimura Satoru

Affiliation and department：
Job title： Associate Professor

Research field (1)： Applied plasma science

Research keywords (14)：低エネルギーイオンビーム , 磁気流体力学 , 波動加熱 , 時間周波数解析 , 計算機トモグラフィー , トカマク , 磁場反転配位 , low energy ion beam experiment , MHD , wave heating , time-frequency analysis , computer tomography , tokamak , FRC

Research theme for competitive and other funds (15)：

2020 - 2021 細孔性粉体へのインジウム注入法の技術開発と高効率触媒合成への応用
2017 - 2020 Development of organometallic molecular ion beam deposition method for the stoichiometric crystal growth
2015 - 2018 Indium implantations onto porous zeolites for the development of novel catalysts
2013 - 2016 Application of ion beam induced chemical vapor deposition for SiC film formation
2010 - 2012 Systematic Study Analyses of radical-surface interaction in plasma bio-processing

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Papers (162)：

Satoru Yoshimura, Takae Takeuchi, Masato Kiuchi. Low-energy N+ ion beam induced chemical vapor deposition using tetraethyl orthosilicate, hexamethyldisiloxane, or hexamethyldigermane. AIP Advances. 2024. 14. 9. 095308
Satoru Yoshimura, Takae Takeuchi, Masato Kiuchi. Low-energy O+ or SiO+ ion beam induced deposition of silicon oxide using hexamethyldisiloxane. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 2024. 549. 165276
Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Kensuke Murai, Masato Kiuchi. Silicon oxide film formation by spraying tetraethyl orthosilicate onto substrate with simultaneous low-energy SiO+ ion-beam irradiation. AIP Advances. 2023. 13. 11. 115107
Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Kensuke Murai, Masato Kiuchi. Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 2023. 1056. 168707
Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Kensuke Murai, Masato Kiuchi. Low energy Si+, SiCH5+, or C+ beam injections to silicon substrates during chemical vapor deposition with dimethylsilane. Heliyon. 2023. 9. 8. e19002

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MISC (40)：

吉村智, 杉本敏司, 竹内孝江, 村井健介, 木内正人. 質量分離有機金属分子イオンビーム堆積法のストイキオメトリ成膜への応用. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2019. 80th
吉村智, 木内正人, 木内正人, 西本能弘, 安田誠, 馬場章夫, 浜口智志. ゼオライトへの低エネルギーインジウムイオン照射と触媒効果. 真空に関する連合講演会講演予稿集. 2014. 55th
吉村智, 幾世和将, 木内正人, 木内正人, 西本能弘, 安田誠, 馬場章夫, 浜口智志. 低エネルギーインジウム照射SiO₂の触媒効果の基板温度依存性. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2013. 60th
幾世和将, 吉村智, 杉本敏司, 木内正人, 木内正人, 浜口智志. 低エネルギーイオンビーム照射によるPMMAエッチングイールドへの紫外線照射および水素プラズマ暴露の影響. 真空に関する連合講演会講演予稿集. 2012. 53rd
吉村智, 塚崎泰裕, 杉本敏司, 木内正人, 木内正人, 浜口智志. 低エネルギーイオンビーム照射によるPMMAエッチングイールドの測定と水素プラズマ暴露のエッチングイールドへの影響. 応用物理学関係連合講演会講演予稿集(CD-ROM). 2012. 59th

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Education (2)：

1992 - 1997 Kyoto University Graduate School of Science
1988 - 1992 Kyoto University Faculty of Science

Professional career (2)：

Doctor (Science) (Kyoto University)
Master (Science) (Kyoto University)

Work history (4)：

2007/04 - 現在 Osaka Univesity Graduate School of Engineering asociate professor
2003/04 - 2007/03 Osaka University Graduate School of Engineering asociate professor
1998/05 - 2003/03 Osaka University Graduate School of Engineering assistant professor
1997/04 - 1998/04 Osaka University Faculty of Engineering assistant professor

Association Membership(s) (7)：

応用物理学会 , SMART PROCESSING SOCIETY FOR MATERIALS, ENVIRONMENT & ENERGY , プラズマ・核融合学会 , 日本物理学会 , The Japan Society of Applied Physics , The Japan Society of Plasma Science and Nuclear Fusion Research , The Physical Society of Japan

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