Harada Tetsuo

ハラダテツヲ | Harada Tetsuo

Affiliation and department：

Research field (1)： Quantum beam science

Research keywords (2)： EUV Lithography , Soft-X-ray Optical Engineering

Research theme for competitive and other funds (7)：

2019 - 2022 EUV Wavefront Synthesizer for Real-Time and Extended Depth-of-Focus Imaging
2019 - 2022 Spatial Distribution Analysis of Photo Resist Using Resonant Soft X-ray Reflectmetry and Scattering methods
2015 - 2018 Precise measurement of optical constants of thin films in soft X-ray region
2013 - 2016 Development of 1X nm EUV Resist with high sensitivity and Low LWR
2010 - 2012 Resist pattern replication using EUV interference lithography for 20 nm and below

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Papers (136)：

Takahiro Ueda, Marcio D. Lima, Tetsuo Harada, Takeo Watanabe, Takeshi Kondo. EUV durability of CNT pellicles for next-generation scanner. Japanese Journal of Applied Physics. 2024. 63. 3
Rikuya Imai, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe. Present Status of EUV Interference Lithography at NewSUBARU. Journal of Photopolymer Science and Technology. 2023. 36. 1. 53-59
Shinji Yamakawa, Tetsuo Harada, Koji Nakanishi, Takeo Watanabe. Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARU. Journal of Photopolymer Science and Technology. 2023. 36. 1. 47-52
Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe. Spatial Distribution Analysis of Polymers in Resist Thin Film by Reflection-mode Resonant Soft X-ray Scattering. Journal of Photopolymer Science and Technology. 2023. 36. 1. 41-45
Shuhei Iguchi, Tetsuo Harada, Shinji Yamakawa, Takeo Watanabe, Takeharu Motokawa. Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope. Journal of Photopolymer Science and Technology. 2023. 36. 1. 25-30

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MISC (190)：

原田哲男. Development of At-Wavelength Mask Microscopes for EUV Lithography. レーザー研究. 2024. 52. 1
「コウシュツリョクタンハチョウコウゲンカイハツトソノオウヨウギジュツノシンテン」トクシュウゴウ. 2024. 52. 1. 31-35
渡邊健夫, 原田哲男, 山川進二. Current Status and Prospect for EUV Lithography. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2023. 70th
篭島靖, 上杉健太朗, 亀島敬, 高橋幸生, 武市泰男, 竹内晃久, 原田哲男, 松本浩典, 三村秀和, 矢代航. 光学界の将来ビジョン X線・極端紫外光における真の回折限界に向けて. 光学. 2022. 51. 4
中本敦啓, 山川進二, 原田哲男, 渡邊健夫. Resonant Soft X-Ray Scattering in Reflection-mode for Spacial Evaluation in Resist Thin Film. X線分析討論会講演要旨集. 2022. 58th

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Patents (4)：

Education (3)：

2003 - 2007 Tohoku University Graduate School of Engineering Department of Applied Physics
2001 - 2003 Tohoku University Graduate School of Engineering Department of Applied Physics
1997 - 2001 Tohoku University Faculty of Engineering

Professional career (1)：

Work history (6)：

2024/04 - 現在 University of Hyogo Laboratory of Advanced Science and Technology for Industry
2024/04 - 現在 University of Hyogo Laboratory of Advanced Science and Technology for Industry Professor
2019/04 - 2024/03 University of Hyogo Laboratory of Advanced Science and Technology for Industry Associate Professor
2008/10 - 2019/03 University of Hyogo Laboratory of Advanced Science and Technology for Industry Assistant Professor
2008/04 - 2008/09 Tohoku University Institute of Multidisciplinary Research for Advanced Materials

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