Kakiuchi Hiroaki

カキウチヒロアキ | Kakiuchi Hiroaki

Affiliation and department：
Homepage URL (1)： http://www.prec.eng.osaka-u.ac.jp

Research field (2)： Electric/electronic material engineering , Thin-film surfaces and interfaces

Research theme for competitive and other funds (33)：

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Papers (212)：

Toshimitsu Nomura, Kenta Kimoto, Hiroaki Kakiuchi, Kiyoshi Yasutake, Hiromasa Ohmi. Si nanocone structure fabricated by a relatively high-pressure hydrogen plasma in the range of 3.3-27 kPa. Journal of Vacuum Science & Technology B. 2022. 40. 3. 032801-032801
Kazushi Yoshida, Hiromasa Ohmi, Kiyoshi Yasutake, Hiroaki Kakiuchi. Formation of indium nitride nanostructures by atmospheric pressure plasma nitridation of molten indium. Journal of Applied Physics. 2021. 130. 6. 063301-063301
Hiroaki Kakiuchi, Hiromasa Ohmi, Kiyoshi Yasutake. Gas-phase kinetics in atmospheric-pressure plasma-enhanced chemical vapor deposition of silicon films. Journal of Applied Physics. 2021. 130. 5. 053307-053307
Kouji Inagaki, Yoshitada Morikawa, Hiromasa Ohmi, Kiyoshi Yasutake, Hiroaki Kakiuchi. Diffusion of excessively adsorbed hydrogen atoms on hydrogen terminated Si(100)(2×1) surface. AIP Advances. 2021. 11. 8. 085318-085318
Kiyoshi Yasutake, Kazushi Yoshida, Hiromasa Ohmi, Hiroaki Kakiuchi. Plasma parameters in very high frequency argon plasmas mixed with nitrogen at atmospheric pressure. Journal of Applied Physics. 2021. 129. 17. 173302-173302

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MISC (140)：

High-Rate and Low-Temperature Si Film Growth Technology and its Application for Thin Film Transistors. 2013. 19. 11. 23-29
High-rate deposition of silicon films by atmospheric-pressure plasma chemical vapor deposition and its application to Si thin film solar cells. 2012. 31. 6. 88-93
垣内弘章, 大参宏昌, 安武潔. 大気圧プラズマを用いた低温・高速成膜技術 (特集プラズマプロセスの応用技術). ケミカルエンジニヤリング. 2010. 55. 12. 889-895
Hiromasa Ohmi, Kazuya Kishimoto, Hiroaki Kakiuchi, Kiyoshi Yasutake. PFC-free dry etching method for Si using narrow-gap VHF plasma at subatmospheric pressure. J. Electrochem. Soc.,. 2010. Vol. 157, No.2, D85
PFC-free dry etching method for Si using narrow-gap VHF plasma at subatmospheric pressure. J. Electrochem. Soc.,. 2010. Vol. 157, No.2, D85

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Patents (16)：

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Books (16)：

Atmospheric-pressure plasma technologies and their applications for thin film deposition
2014
Monthly DISPLAY
2013
大気圧プラズマCVDによるSi高速成膜と太陽電池への応用 OPTRONICS, 2012, No. 6, 88-93. (共著)
株式会社オプトロニクス社 2012
大気圧プラズマCVDによるシリコン薄膜の形成「改訂版大気圧プラズマの生成制御と応用技術」 pp.197-219, 2012 (共著)
サイエンス&テクノロジー株式会社 2012 ISBN:9784864280396
大気圧プラズマの技術とプロセス開発
シーエムシー出版 2011 ISBN:9784781304076

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Works (4)：

Education (5)：

Professional career (2)：

Work history (10)：

2020/04/01 - 現在 Osaka University Graduate School of Engineering . Associate Professor
2001/08 - 現在大阪大学大学院工学研究科助教授
1998/04 - 現在大阪大学大学院工学研究科助手
1991/04 - 現在大阪大学工学部助手
2007/04/01 - 2020/03/31 Osaka University Graduate School of Engineering Division of Precision Science & Technology and Applied Physics Associate Professor

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Awards (5)：

2015/11 - Taiwan Association for Coatings and Thin Films Technology Poster award of excellence
2004/03 - 社団法人精密工学会精密工学会沼田記念論文賞
2003/10 - 精密工学会 2003年度精密工学会秋季大会学術講演会ベストオーガナイザー賞「機能性薄膜」
1994 - 1994年度精密工学会関西支部講演論文賞
1992/08 - 精密工学会精密工学会関西支部講演論文賞

Association Membership(s) (2)：

The Japan Society of Applied Physics , The Japan Society for Precision Engineering

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