Rchr
J-GLOBAL ID:200901028006942571   Update date: Sep. 02, 2020

Kakiuchi Hiroaki

カキウチ ヒロアキ | Kakiuchi Hiroaki
Affiliation and department:
Research field  (2): Electric/electronic material engineering ,  Thin-film surfaces and interfaces
Research theme for competitive and other funds  (4):
  • プラズマの計測と制御
  • 機能薄膜の低温かつ高速成膜
  • Diagnostics and controle of plasma
  • Low temperature and high-rate deposition of functional materials
Papers (80):
more...
MISC (103):
Books (3):
  • High-rate deposition of amorphous silicon films by atmospheric pressure plasma chemical vapor deposition
    Crystal Growth Technology, Edited by H. J. Scheel and T. Fukuda, John Wiley & Sons Ltd 2003
  • Plasma CVM (Chemical Vapor Machining) - A Chemical Machining Method with Equal Performance to Conventional Mechanical Methods from the sence of Removal Rates and Spatial Resolutions
    Proceedings of the 7th International Precision Engineering Seminar. 1993
  • Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure
    Proceedings of the 7th International Precision Engineering Seminar. 1993
Works (4):
  • グローバルCOE 高機能化原子制御製造プロセス教育研究拠点
    2008 -
  • Center of Excellence for Atomically Controlled Fabrication Technology
    2008 -
  • 原子論的生産技術の創出拠点
    2004 -
  • 原子論的生産技術の創出拠点
    2004 -
Education (4):
  • - 1991 Osaka University
  • - 1991 Osaka University
  • - 1989 Osaka University
  • - 1989 Osaka University Department of Precision Engineering
Professional career (2):
  • master of Engineering (Osaka University)
  • Doctor of Engineering (Osaka University)
Work history (4):
  • 1991 - 2001 Osaka University
  • 1991 - 2001 Osaka University, Research Associate
  • 2001 - - 大阪大学 助教授
  • 2001 - - Osaka University, Associate Proffesor
Awards (1):
  • 1994 - 1994年度精密工学会 関西支部講演論文賞
Association Membership(s) (2):
The Japan Society of Applied Physics ,  The Japan Society for Precision Engineering
※ Researcher’s information displayed in J-GLOBAL is based on the information registered in researchmap. For details, see here.

Return to Previous Page