KAKIUCHI Hiroaki

カキウチヒロアキ | KAKIUCHI Hiroaki

Affiliation and department：
Job title： associate professor

Research field (2)： Thin film/Surface and interfacial physical properties , Electronic materials/Electric materials

Research theme for competitive and other funds (2)：

MISC (56)：

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Books (3)：

Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure
Proceedings of the 7th International Precision Engineering Seminar. 1993
Plasma CVM (Chemical Vapor Machining) - A Chemical Machining Method with Equal Performance to Conventional Mechanical Methods from the sence of Removal Rates and Spatial Resolutions
Proceedings of the 7th International Precision Engineering Seminar. 1993
High-rate deposition of amorphous silicon films by atmospheric pressure plasma chemical vapor deposition
Crystal Growth Technology, Edited by H. J. Scheel and T. Fukuda, John Wiley & Sons Ltd 2003

Works (1)：

Education (2)：

- 1989 Osaka University Faculty of Engineering Department of Precision Engineering
- 1991 Osaka University Graduate School, Division of Engineering

Professional career (2)：

Work history (2)：

Association Membership(s) (1)：

Japan Society for Precision Engineering

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