Rchr
J-GLOBAL ID:200901028006942571   Update date: Aug. 25, 2011

KAKIUCHI Hiroaki

カキウチ ヒロアキ | KAKIUCHI Hiroaki
Affiliation and department:
Job title: associate professor
Research field  (2): Thin film/Surface and interfacial physical properties ,  Electronic materials/Electric materials
Research theme for competitive and other funds  (2):
  • Low temperature and high-rate deposition of functional materials
  • Diagnostics and controle of plasma
MISC (56):
Books (3):
  • Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure
    Proceedings of the 7th International Precision Engineering Seminar. 1993
  • Plasma CVM (Chemical Vapor Machining) - A Chemical Machining Method with Equal Performance to Conventional Mechanical Methods from the sence of Removal Rates and Spatial Resolutions
    Proceedings of the 7th International Precision Engineering Seminar. 1993
  • High-rate deposition of amorphous silicon films by atmospheric pressure plasma chemical vapor deposition
    Crystal Growth Technology, Edited by H. J. Scheel and T. Fukuda, John Wiley & Sons Ltd 2003
Works (1):
  • Center of Excellence for Atomically Controlled Fabrication Technology
    2008 -
Education (2):
  • - 1989 Osaka University Faculty of Engineering Department of Precision Engineering
  • - 1991 Osaka University Graduate School, Division of Engineering
Professional career (2):
  • master of Engineering (Osaka University)
  • Doctor of Engineering (Osaka University)
Work history (2):
  • 1991 - 2001 Osaka University, Research Associate
  • 2001 - Osaka University, Associate Proffesor
Association Membership(s) (1):
Japan Society for Precision Engineering
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