Rchr
J-GLOBAL ID:200901036782984767   Update date: Feb. 08, 2024

Kiuchi Masato

キウチ マサト | Kiuchi Masato
Affiliation and department:
Homepage URL  (1): http://www.camt.eng.osaka-u.ac.jp/member.html
Research field  (5): Material fabrication and microstructure control ,  Civil engineering (environmental systems) ,  Electric/electronic material engineering ,  Basic plasma science ,  Applied plasma science
Research keywords  (6): バイオ処理 プラズマ分解 硬質薄膜 イオンビーム蒸着 分子軌道法 ,  SiC ,  Molecular orbital method ,  hard coating ,  Ion beam Deposition ,  Dynamic ion beam mixing
Research theme for competitive and other funds  (14):
  • 2015 - 2018 Indium implantations onto porous zeolites for the development of novel catalysts
  • 2013 - 2016 Application of ion beam induced chemical vapor deposition for SiC film formation
  • 2013 - 2016 Study on the development of an electrical generation system depending on the electrochemical mechanisms related to microbiologically inducing corrosion of metals
  • 2015 - 2016 質量分析法に基づく「カビ臭物質」のモニタリングと文化財カビ汚染制御法の確立
  • 2013 - 2015 Volatile organic compounds emitted in the headspace by fungal colonies play some communicating roles between co-cultured ones.
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Papers (166):
  • Satoru Yoshimura, Takae Takeuchi, Masato Kiuchi. Low-energy O+ or SiO+ ion beam induced deposition of silicon oxide using hexamethyldisiloxane. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 2024. 549. 165276-165276
  • Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Kensuke Murai, Masato Kiuchi. Silicon oxide film formation by spraying tetraethyl orthosilicate onto substrate with simultaneous low-energy SiO+ ion-beam irradiation. AIP Advances. 2023. 13. 11
  • Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Kensuke Murai, Masato Kiuchi. Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 2023. 1056. 168707-168707
  • Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Kensuke Murai, Masato Kiuchi. Low energy Si+, SiCH5+, or C+ beam injections to silicon substrates during chemical vapor deposition with dimethylsilane. Heliyon. 2023. e19002-e19002
  • Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Masato Kiuchi. Low-energy Ar+ ion-beam-induced chemical vapor deposition of silicon dioxide films using tetraethyl orthosilicate. Heliyon. 2023. e14643-e14643
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MISC (125):
Education (2):
  • 1982 - 1986 大阪大学 工学研究科
  • 1978 - 1982 Osaka University School of Engineering
Professional career (1):
  • Ph. D (Osaka University)
Work history (7):
  • 2023/04 - 現在 Osaka University Graduate School of Engineering, Division of Materials and Manufacturing Science
  • 2020/04 - 2023/03 大阪大学 工学研究科附属アトミックデザイン研究センター 特任教授
  • 2001/04 - 2020/03 National Institute of Advanced Industrial Science and Technology
  • 2003/04 - 2008/03 産業技術総合研究所 連携研究体長
  • 1991/10 - 2001/03 通商産業省工業技術院大阪工業技術試験所 主任研究官
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Awards (2):
  • 科学技術庁 第50回注目発明選定
  • 文部科学省 第60回注目発明選定
Association Membership(s) (4):
日本水環境学会 ,  表面技術協会 ,  応用物理学会 ,  The Japan Society of Vacuum and Surface Science
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