Rchr
J-GLOBAL ID:200901038133914167   Update date: Aug. 02, 2022

Tamura Susumu

タムラ ススム | Tamura Susumu
Research field  (1): Electric/electronic material engineering
Research theme for competitive and other funds  (4):
  • 強誘電体薄膜の成長
  • GaAs薄膜の低温成長
  • Growth of ferroelectric film
  • Low temperature GaAs film growth
MISC (89):
Lectures and oral presentations  (17):
  • A Study on Method of Semiconductor Material Measurement Supported by Accurate FDTD EM-field Simulation in Millimeter-wave Range
    (2007 Int. Meeting for Future of Electron Devices, Kansai 2007)
  • FDTDシミュレーション技術を用いた材料測定法に関する検討-ミリ波帯金属表皮抵抗と半導体ウェハを含む誘電体板の測定-
    (電子情報通信学会 2007)
  • A Study on Method of Semiconductor Material Measurement Supported by Accurate FDTD EM-field Simulation in Millimeter-wave Range
    (2007 Int. Meeting for Future of Electron Devices, Kansai 2007)
  • Ferroelectric Characteristic of Group IV Elements added SrBi2Ta2O7 Thin Films
    (14th Workshop on Dielectrics in Microelectronics 2006)
  • Ferroelectric Characteristic of Group IV Elements added SrBi2Ta2O7 Thin Films
    (14th Workshop on Dielectrics in Microelectronics 2006)
more...
Works (16):
  • Electrical Properties of group 4 elements added SrBi2Ta2O9 thin films
    2004 -
  • Xe-Lamp-Induced UV ligt Irradiation Effect on SiO2 Film growth during dry oxidation
    2004 -
  • Effect of Silicon Addision on the Electrical Properties of SrBi2Ta2O9 Thin Films
    2004 -
  • Electrical Properties of group 4 elements added SrBi2Ta2O9 thin films
    2004 -
  • Xe-Lamp-Induced UV ligt Irradiation Effect on SiO2 Film growth during dry oxidation
    2004 -
more...
Education (2):
  • - 1971 Kansai University Faculty of Engineering
  • - 1971 Kansai University Faculty of Engineering Department of Electronics
Work history (1):
  • Kansai University Faculty of Engineering Science Department of Electrical and Electronic Engineering Associate Professor
Association Membership(s) (6):
材料学会 ,  電子情報通信学会 ,  応用物理学会 ,  information and Communication Engineers ,  The Institute of Electronics ,  The Japan Society of Applied Physics
※ Researcher’s information displayed in J-GLOBAL is based on the information registered in researchmap. For details, see here.

Return to Previous Page