Rchr
J-GLOBAL ID：200901038330379737
Update date: Mar. 12, 2010
SHIRAI Hajime
シライ ハジメ | SHIRAI Hajime
Affiliation and department：
Saitama University
About Saitama University
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Detailed information
Job title：
Professor
Research theme for competitive and other funds (1)：
-
MISC (16)：
Y.Fujimura, S.H.Jung, H.Shirai. Formation of Self-Assembled Nanocrystalline Sillicon Dots by SiCl4/H2 RF Plasma-Enhanced Chemical Vapor Deposition. Jpn. J. Appl. Phys. 2001. 40. 11B. L1214-1216-L1216
Y.Sakuma, H.Shirai, H. Liu, Y. Sakuma, H. Ueyama. Low Temperature Formation of Microcrystalline Silicon Films Using High-Density SiH4 Microwave Plasma. Thin Solid Films. 2001. 386. 2. 261-266
H.Shirai, K. Yoshino, G. Ohkawara, H. Ueyama,. Novel High-Density Microwave Plasma Utilizing an Internal Spoke Antenna for Fast Deposition of Microcrystalline Silicon Films. Jpn. J. Appl. Phys. 2001. 40. 7A. L701-704-L704
白井 肇. 大気圧マイクロプラズマジェットの生成と制御に基づいた局所反応場の設計. 総合研究機構研究プロジェクト研究成果報告書. 2005. 16年度
白井 肇. High-density microwave plasma of SiH4/H-2 for high rate growth of highly crystallized microcrystalline silicon films. EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS. 2006. 33. 3. 153-159
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