Rchr
J-GLOBAL ID：200901040955350642
Update date: Aug. 20, 2024
Kobayashi Kiyoteru
コバヤシ キヨテル | Kobayashi Kiyoteru
Affiliation and department：
Job title：
General Manager
Research field (2)：
Electric/electronic material engineering
, Thin-film surfaces and interfaces
Research keywords (4)：
Thermal Desorption Spectroscopy
, Nature and electrical properties of thin dielectric film
, Charge trap film
, LSI process technology
Research theme for competitive and other funds (3)：
- 2018 - 2021 電荷捕獲膜のトラップ準位のエネルギー分布制御に関する研究
- 2014 - 2017 低誘電率絶縁膜の電荷捕獲メモリへの応用に関する研究
- 2009 - 2012 Studies on nature of defect centers and charge trapping characteristics of silicon nitride films and low dielectric constant dielectric films for the nonvolatile memory applications
Papers (61)：
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Kiyoteru Kobayashi, Ryo Miyauchi, Kenshi Kimoto. Influence of high-temperature thermal annealing on paramagnetic point defects in silicon-rich silicon nitride films formed in a single-wafer-type low-pressure chemical vapor deposition reactor. Journal of Vacuum Science & Technology A. 2024
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Kiyoteru Kobayashi, Soichiro Nakagawa. Electrical analysis of energy depth of electron trap states in silicon nitride films for charge-trap flash memory application. 2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC). 2021
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Kiyoteru Kobayashi, Hiroshi Mino. Hole trapping capability of silicon carbonitride charge trap layers. EPJ Applied Physics. 2020. 91. 1
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R. Agrawal, K. Kobayashi. First-principles study of defect levels caused by transition metal atoms in silicon nitride for non-volatile memory applications. ECS Transactions. 2020. 98. 8. 65-75
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H. Mino, K. Kobayashi. Experimental Extraction of the Charge Centroid of Holes Trapped in Metal-OxideNitride-Oxide-Semiconductor Memories. ECS Transactions. 2018. 86. 3. 23-32
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MISC (19)：
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Shuji Nagano, Kaoru Sakoda, Satoshi Hasaka, Kiyoteru Kobayashi. Internal repair for plasma damaged low-k films by methylating chemical vapor. Advanced Metallization Conference (AMC). 2010. 33-34
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Kiyoteru Kobayashi, Hitoshi Aoyagi, Hiroaki Kuwabara, Kazuyoshi Maekawa, Keiichiro Kashihara, Tadashi Yamaguchi, Koyu Asai, Kazuhito Honda, Yukinori Hirose. Depth profile analysis of nickel silicide films using time-of-flight secondary ion mass spectrometry (TOF-SIMS). Semiconductor Technology, ISTC2007 - Proceedings of the 6th International Conference on Semiconductor Technology. 2006. 538-545
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T Ogata, M Inoue, T Nakamura, N Tsuji, K Kobayashi, K Kawase, H Kurokawa, T Kaneoka, Y Ohno, H Miyoshi. Impact of nitridation engineering on microscopic SILC characteristics of sub-10-nm tunnel dielectrics. INTERNATIONAL ELECTRON DEVICES MEETING 1998 - TECHNICAL DIGEST. 1998. 597-600
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TERAMOTO Akinobu, KOBAYASHI Kiyoteru, OHNO Yoshikazu, HIRAYAMA Makoto. Highly Reliable SiO_2 Films Formed by UV-O_2 Oxidation. 1997. 1997. 14-15
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MK Mazumder, A Teramoto, K Kobayashi, M Sekine, S Kawazu, H Koyama. Degradation of the characteristics of p(+) poly MOS capacitors with NO nitrided gate oxide due to postnitrogen annealing. 1997 IEEE INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP FINAL REPORT. 1997. 142-143
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Patents (10)：
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Semiconductor device and manufacturing method thereof
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Semiconductor device comprising trench-isolated transistors
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Non-volatile semiconductor memory device with improved performance
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Methods of writing/erasing of nonvolatile semiconductor storage device
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Nonvolatile semiconductor device
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Books (7)：
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集積回路のための半導体デバイス工学
コロナ社 2018 ISBN:9784339009095
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ECS Transactions, Volume 75, Issue 32, PRiME 2016/230th ECS Meeting, October 2, 2016 - October 7, 2016, Honolulu, Nonvolatile Memories 5
The Electrochemical Society 2017
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ECS Transactions Volume 69, Issue 3 228th ECS Meeting October 11, 2015 - October 15, 2015 Phoenix, AZ Nonvolatile Memories 4
The Electrochemical Society 2015
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ECS Transactions Volume 64 Cancun, Mexico, October 5 - 9, 2014 2014 ECS and SMEQ Joint International Meeting
The Electrochemical Society 2014
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電気化学便覧 第6版
丸善 2013
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Lectures and oral presentations (30)：
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First-Principles Calculation for Defect Levels of 3d Transition Metals Doped in Silicon Nitride
(2022 9th International Symposium on Control of Semiconductor Interfaces 2022)
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Determination of charge centroid locations of electrons and holes trapped in silicon nitride charge-trap layers
(Asia Pacific Society for Materials Research 2021 Annual Meeting 2021)
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Determination of Charge Centroid and Density of Holes Trapped in Metal-Oxide-Nitride-Oxide-Semiconductor-type Non-Volatile Memory Devices
(Abstracts of 28th International Conference on Amorphous and Nano-crystalline Semiconductors (ICANS) 2019)
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Determination of the Charge Centroid of Holes Trapped in MONOS-Type Memories at High Gate Voltages,
(18th Non-Volatile Memory Technology Symposium (NVMTS 2018) 2018)
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Experimental Extraction of the Charge Centroid of Holes Trapped in Metal-OxideNitride-Oxide-Semiconductor Memories
(Americas International Meeting on Electrochemistry and Solid State Science 2018)
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Education (3)：
- 1997 - 1997 Nagoya University Graduate School of Engineering
- 1981 - 1983 名古屋大学大学院 工学研究科 応用物理学専攻前期課程
- 1977 - 1981 Nagoya University School of Engineering
Professional career (1)：
Work history (4)：
- 2024/04 - 現在 ESCO, Ltd. Research Laboratory General Manager
- 2005/04 - 2024/03 Tokai University School of Engineering Professor
- 2003/04 - 2005/03 Renesas Technology Group Manager
- 1983/04 - 2003/03 Mitsubishi Electric Corpration Group Manager
Committee career (18)：
- 2007 - 現在 電気化学会電子材料委員会 副委員長
- 2023/03 - 2024/03 第87回半導体・集積回路技術シンポジウム プログラム委員会 委員長
- 2020 - 2024/03 日本学術振興会R025先進薄膜界面機能創成委員会 委員
- 2011 - 2024/03 私立大学情報教育協会 CCC電気通信工学グループ運営委員会 運営委員
- 2021 - 2022 ISCSI-IX (9th International Symposium on Control of Semiconductor Interfaces) 国際プログラム委員会 委員
- 2021 - 2022 第86回半導体・集積回路技術シンポジウム 論文委員会 委員長
- 2020 - 2021 第85回半導体・集積回路技術シンポジウム 論文委員会 委員長
- 2020 - 2020 第84回半導体・集積回路技術シンポジウム 論文委員会 委員長
- 2019 - 2020 PRiME 2020, Symposium:H06 - Nonvolatile Memories and Artificial Neural Networks, Symposium organizer Symposium organizer
- 2006 - 2020 半導体界面制御技術第154委員会 委員
- 2018 - 2019 第83回半導体・集積回路技術シンポジウム 実行委員会 委員長
- 2017 - 2018 AiMES 2018 (Americas International Meeting on Electrochemistry and Solid State Science 2018), Symposium: D04 Nonvolatile Memories 6 Symposium organizer
- 2017 - 2018 第82回半導体・集積回路技術シンポジウム 実行委員会 委員長
- 2009 - 2011 2011 Int. Workshop on DIELECTRIC THIN FILMS FOR FUTURE DEVICESプログラム委員会 委員
- 2009 - 2010 第74回半導体・集積回路技術シンポジウム プログラム委員会 委員長
- 2010 - 6th International Symposium on Control of Semiconductor Interfaces, International Technical Program Committee International Technical Program Committee member
- 2007 - 2008 第72回半導体・集積回路技術シンポジウム プログラム委員会 委員長
- 2006 - 2007 5th International Symposium on Control of Semiconductor Interfaces組織委員会 委員
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Association Membership(s) (4)：
The Electrochemical Society
, 電子情報通信学会
, THE ELECTROCHEMICAL SOCIETY OF JAPAN
, 応用物理学会
