Rchr
J-GLOBAL ID：200901056259032010
Update date: Aug. 29, 2020
Heck Claire
ヘック クライレ | Heck Claire
Contact this researcher
You can send email directly to the researcher.
Affiliation and department：
National Institute of Advanced Industrial Science and Technology
About National Institute of Advanced Industrial Science and Technology
Search "National Institute of Advanced Industrial Science and Technology"
Detailed information
Homepage URL (1)：
http://www.aist.go.jp/RESEARCHERDB/cgi-bin/worker_detail.cgi?call=namae&rw_id=C78632939
MISC (4)：
A Chayahara, Y Mokuno, A Kinomura, N Tsubouchi, C Heck, Y Horino. Metal plasma source for PBII using arc-like discharge with hot cathode. SURFACE & COATINGS TECHNOLOGY. 2004. 186. 1-2. 157-160
C Heck, A Chayahara, Y Horino, RMN Miranda, MM Miranda, MN Baibich. Fe deposition or implantation into vacuum arc deposited Cr films. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS. 2003. 42. 7A. 4457-4458
C. Heck, A. Chayahara, Y. Horino, Y. Yokota, R. M. Miranda, A. B. Antunes, M. M. Miranda, M. N. Baibich. Electronic transport in thin Cr films modified by Fe ion implantation. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 2001. 175-177. 296-299
A Kinomura, A Chayahara, N Tsubouchi, C Heck, Y Horino, Y Miyagawa. Movement of defects and atoms during ion beam induced crystallization. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS. 2001. 175. 319-323
※ Researcher’s information displayed in J-GLOBAL is based on the information registered in
researchmap
.
For details, see here
.
Return to Previous Page
TOP
