T. Mizuno, R. Kanazawa, Y. Omata, T. Aoki, T. Sameshima. SiC Dots in Amorphous-Si and Poly-Si Substrates Fabricated by Hot-C+ -Ion Implantation. Extended Abst. of Solid State Devices and Materials. 2018. 803-804
T. Mizuno, S. Nakada, M. Yamamoto, S. Irie, T. Aoki, T. Sameshima. SiC Nano-Dot Controlled by Hot-C+-Ion Implantation Conditions in Bulk-Si Substrate for Photonic Devices. Abst. IEEE Silicon Nanoelectronics Workshop. 2018. 121-122
T. Mizuno, Y. Omata, S. Nakada, T. Aoki, T. Sasaki. Hot-C+-Ion Implantation Optimization for Forming Nano-SiC Region at Surface (100)SOI Substrate. Extended Abst. of SSDM. 2017. 537-538
T. Mizuno, S. Nakada, M. Yamamoto, S. Irie, Y. Omata, T. Aoki, T. Sameshima. SiC Nano-Dots in Bulk-Si Substrate Fabricated by Hot-C+-Ion Implantation Technique. Extended Abst. of SSDM. 2017. 597-598
SiC Dots in Amorphous-Si and Poly-Si Substrates Fabricated by Hot-C+ -Ion Implantation
(International Conference on Solid State Devices and Materials 2018)
SiC Nano-Dot Controlled by Hot-C+-Ion Implantation Conditions in Bulk-Si Substrate for Photonic Devices
(IEEE Silicon Nanoelectronics Workshop (SNW) 2018)
SiC Nano-Dots in Bulk-Si SubstrateFabricated by Hot-C+-Ion Implantation Technique
(SSDM 2017)