Yasuda Masaaki

ヤスダマサアキ | Yasuda Masaaki

Affiliation and department：
Job title： Associate Professor

Research field (4)： Electronic devices and equipment , Nanostructure physics , Crystal engineering , Applied materials

Research keywords (4)：電子ビーム応用 , 微細加工 , ナノ計算科学 , Application of Electron Beam

Research theme for competitive and other funds (9)：

2019 - 2021 Development of contrast-amplified observation method for low-voltage secondary electron images
2015 - 2018 スケール境界領域におけるパターン形成技術に関する理論的研究
2013 - 2016 電子線ナノプロセスのマルチフィジックスシミュレーション
2011 - 2014 モンテカルロ法・分子動力学法融合型次世代電子線リソグラフィシミュレーションの開発
2010 - 2013 ナノカーボン材料を対象とした電子ビーム構造制御の理論解析

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Papers (143)：

Chen Tang, Atsushi Sekiguchi, Yosuke Ohta, Yoshihiko Hirai, Masaaki Yasuda. Surface property control for 193 nm immersion resist by addition of Si compound. Journal of Vacuum Science & Technology B. 2023. 41. 1. 012602
Yoshihiko Hirai, Sou Tsukamoto, Hidekatsu Tanabe, Kai Kameyama, Hiroaki Kawata, Masaaki Yasuda. Smart Systems for Material and Process Designing in Direct Nanoimprint Lithography Using Hybrid Deep Learning. Nanomaterials. 2022. 12. 15. 2571-2571
Bunta Inoue, Masanori Koyama, Atsushi Sekiguchi, Masamitsu Shirai, Yoshihiko Hirai, Masaaki Yasuda. Stochastic Simulation of Development Process in Electron Beam Lithography. Journal of Photopolymer Science and Technology. 2021. 34. 6. 661-665
M. Koyama, K. Imai, M. Shirai, Y. Hirai, M. Yasuda. Effects of acid diffusion and resist molecular size on line edge roughness for chemically amplified resists in EUV lithography: computational study. Jpn. J. Appl. Phys. 2021. 60. 106505
S. Tsukamoto, H. Tanabe, R. Yamamura, K. Kameyama, H. Kawata, M. Yasuda, Y. Hirai. Proposal of Hybrid Deep Learning System for Process and Material Design in Thermal Nanoimprint Lithography. J. Photopolym. Sci. Technol. 2021. 34. 2. 145-148

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MISC (47)：

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Books (4)：

Computational Chemistry: Theories, Methods and Applications
Nova Science Publishers 2014
Advances in Nanotechnology. Volume 11
Nova Science Publishers 2014
Lithography, Capt.26 : Molecular Dynamics Study on Mold and Pattern Breakages in Nanoimprint Lithography
IN-TECH 2010
表面分析技術選書計算シミュレーションと分析データ解析第4・2節電子散乱のシミュレーション
丸善株式会社 2008

Lectures and oral presentations (8)：

Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography
(36th International Conference of Photopolymer Science and Technology 2019)
Computational Study of Pattern Formation in UV Nanoimprint Lithography
(35th Int. Conf. of Photopolym. Sci. and Technol. 2018)
Computational Study of Temperature Distribution in Electron-Irradiated Graphene
(11th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’17 2017)
Multiscale Simulation of Development Process in Electron Beam Lithography
(34th Int. Conf. of Photopolym. Sci. and Technol. 2017)
Multiphysics Simulation of Nanopatterning in Electron Beam Lithography
(33rd Int. Conf. of Photopolym. Sci. and Technol. 2016)

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Education (4)：

Professional career (1)：

Committee career (7)：

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Association Membership(s) (4)：

米国マイクロビームアナリシス学会 , 日本表面真空学会 , 日本顕微鏡学会 , 応用物理学会

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