Research field (4)：
Electric/electronic material engineering
, Thin-film surfaces and interfaces
, Applied plasma science
, Basic plasma science
Research keywords (6)：
plasma
, semiconductor
, defects
, hydrogen
, solar cells
, passivation
Research theme for competitive and other funds (6)：
2020 - 2024 Mechanism elucidation of spatio-temporal structure formation of sheath fluctuation using optically trapped fine particles in plasmas
2018 - 2021 Hydrogen-mediated defect passivation of semiconductor materials during plasma processing
2015 - 2018 Generation and annihilation mechanisms of plasma-induced defects on semiconductor surface
2012 - 2015 Transport properties and defect kinetics during silicon thin film growth
2002 - 2005 微粒子プラズマ中の波動と物質創製に関する研究
1996 - 1999 プラズマ中における微粒子の輸送過程
Show all
Papers (62)：
Kosuke Takenaka, Shota Nunomura, Yuji Hayashi, Hibiki Komatsu, Susumu Toko, Hitoshi Tampo, Yuichi Setsuhara. Stability and gap states of amorphous In-Ga-Zn-Ox thin film transistors: Impact of sputtering configuration and post-annealing on device performance. Thin Solid Films. 2024. 790. 140203-140203
Shota Nunomura, Kunihiro Kamataki, Takehiko Nagai, Tatsuya Misawa, Shinji Kawai, Kosuke Takenaka, Giichiro Uchida, Kazunori Koga. Plasma Synthesis of Silicon Nanoparticles: From Molecules to Clusters and Nanoparticle Growth. IEEE Open Journal of Nanotechnology. 2022. 3. 94-100
Mickaël Lozac'h, Shota Nunomura. Role of silicon surface, polished 〈100〉 and 〈111〉 or textured, on the efficiency of double-sided TOPCon solar cells. Progress in Photovoltaics: Research and Applications. 2020. 28. 10. 1001-1011
Shota Nunomura, Isao Sakata, Hajime Sakakita, Kazunori Koga, Masaharu Shiratani. Real-time monitoring of surface passivation of crystalline silicon during growth of amorphous and epitaxial silicon layer. Journal of Applied Physics. 2020. 128. 3
Shota Nunomura, Isao Sakata, Koji Matsubara. Hydrogen-induced defects in crystalline silicon during growth of an ultrathin a-Si:H layer. Japanese Journal of Applied Physics. 2020. 59
