Rchr
J-GLOBAL ID：200901071621880821
Update date: Sep. 16, 2022
Iwase Mitsuo
イワセ ミツオ | Iwase Mitsuo
Affiliation and department：
Tokai University School of Engineering, Department of Materials Science
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Detailed information
Research field (1)：
Electric/electronic material engineering
Research keywords (2)：
電子材料
, Semiconductor Devices
Research theme for competitive and other funds (4)：
ポーラスシリコンのESR法による評価
イオンビームアシスト蒸着法による薄膜形成技術
ESR study of porous silicon
Thin Film Deposition by Ion-Beam-Assisted Deposition
MISC (88)：
K Sato, T Izumi, M Iwase, Y Show, H Morisaki, T Yaguchi, T Kamino. Nucleation and growth of nanocrystalline silicon studied by TEM, XPS and ESR. APPLIED SURFACE SCIENCE. 2003. 216. 1-4. 376-381
CM-GFS源を用いたPtドープTio
2
薄膜の結晶構造変化. BEAMS 2001 粒子線技術シンポジウム学会. 2001. 85-88
Electron Enission from diomond films with Various Roughnesses at Sil Diamond. New Diamond and Frontier carbon Technology. 2001. 11.3.231
Effect of defects introduced by nitrogen doping on elecfron emission from diamond films. Materials chemistry and Physics. 2001
Formation of Carbon Nanotube by using RF Plasma CVD Eqipment from Acetylene and Hydrogen easese. Mate.Res.Soc.Symp.Proc. 2001. A13,12, 1-6
ｍore...
Awards (1)：
2003 - 学術写真優秀賞(日本セラミック協会
Association Membership(s) (5)：
日本表面科学会
, 応用物理学会
, MATERIALS RESEARCH SOCIETY
, AMERICAN VACUUM SOCIETY
, 電気学会
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