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J-GLOBAL ID:200902211567362445   Reference number:03A0506041

Nucleation and growth of nanocrystalline silicon studied by TEM, XPS and ESR

ナノ結晶シリコンの核形成及び成長のTEM,XPS及びESRによる研究
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Volume: 216  Issue: 1/4  Page: 376-381  Publication year: Jun. 30, 2003 
JST Material Number: B0707B  ISSN: 0169-4332  Document type: Article
Article type: 短報  Country of issue: Netherlands (NLD)  Language: ENGLISH (EN)
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Semi thesaurus term:
Thesaurus term/Semi thesaurus term
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All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.

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Oxide thin films 

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